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| Description
| - In the present work, a complex XRD study was performed on the films sputtered by dual magnetron on the glass and single-crystal Si substrates. A set of nanocrystalline films with different thickness in the interval of 0.1μm to 2μm was investigated after the deposition. The measurement was performed on Philips XPert MRD in parallel beam setup, 2Θ scans with very low angles of incidence with collimators and Goebel mirror in the primary beam. X-ray reflectivity curves were measured too. The curves dropped rapidly for all the samples except the thinnest one (0.1μm). In addition, contact angles of water drops on the film surface were measured after different periods of films irradiation by UV light. The films deposited on glass substrate shown similar behavior to the ones on Si substrate in many cases but there are also significant differences. The films on silicon show usually more pronounced texture.
- In the present work, a complex XRD study was performed on the films sputtered by dual magnetron on the glass and single-crystal Si substrates. A set of nanocrystalline films with different thickness in the interval of 0.1μm to 2μm was investigated after the deposition. The measurement was performed on Philips XPert MRD in parallel beam setup, 2Θ scans with very low angles of incidence with collimators and Goebel mirror in the primary beam. X-ray reflectivity curves were measured too. The curves dropped rapidly for all the samples except the thinnest one (0.1μm). In addition, contact angles of water drops on the film surface were measured after different periods of films irradiation by UV light. The films deposited on glass substrate shown similar behavior to the ones on Si substrate in many cases but there are also significant differences. The films on silicon show usually more pronounced texture. (en)
- V práci jsou diskutovány výsledky komplexní XRD studie nanokrystalických vrstev TiO2 připravených duálním magnetronem na skleněné a Si substráty, jejichž tloušťka se pohybovala v intervalu h=0.1μm-2μm. Měření bylo provedeno na zařízení Philips XPert MRD v uspořádání s paralelním svazkem. Byla sledována i reflektivita X-ray záření, jejíž hodnata prudce klesala pro všechny vzorky s tloušťkou h>100nm. U vrstev byla sledována jejich fotoaktivita charakterizovaná rychlostí poklesu kontaktního úhlu mezi povrchem vrstvy a vodou během aktivace vrstev UV zářením. Vrstvy připravené na skleněné i Si substráty vykazovaly podobné vlastnosti. Výrazný rozdíl by pozorován pouze u nejtenčí vrstvy s h=100nm, která byla (cs)
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| Title
| - Growth of nanocrystalline magnetron sputtered TiO2 thin films studied by X-ray scattering
- Růst tenkých vrstev TiO2 připravených magnetronovým naprašováním a jejich XRD analýza (cs)
- Growth of nanocrystalline magnetron sputtered TiO2 thin films studied by X-ray scattering (en)
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| skos:prefLabel
| - Growth of nanocrystalline magnetron sputtered TiO2 thin films studied by X-ray scattering
- Růst tenkých vrstev TiO2 připravených magnetronovým naprašováním a jejich XRD analýza (cs)
- Growth of nanocrystalline magnetron sputtered TiO2 thin films studied by X-ray scattering (en)
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| skos:notation
| - RIV/49777513:23520/06:00000017!RIV08-GA0-23520___
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(GA106/06/0327), Z(MSM0021620834)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/06:00000017
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| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - titanium oxide; nanocrystalline thin films; hydrophilicity; X-ray diffraction and reflection (en)
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| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
| - Materials Structure in Chemistry, Biology, Physics and Technology
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| http://linked.open...in/vavai/riv/obor
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| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
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| http://linked.open...vavai/riv/projekt
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| http://linked.open...UplatneniVysledku
| |
| http://linked.open...iv/tvurceVysledku
| - Heřman, David
- Musil, Jindřich
- Kužel, Radomír
- Nichtová, L.
- Matěj, Z.
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| http://linked.open...n/vavai/riv/zamer
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| issn
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| number of pages
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| http://localhost/t...ganizacniJednotka
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