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  • The new quaternary Si-B-C-N materials attract great interest due to their potential applications in coating technologies and microelectronics. These material s can posses a useful set of properties, such as very high hardness, extremely high temperature resistance, chemical inertness, a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on a chemical vapour deposition at elevated temperatures or on a polymer precursor pyrolysis, were used to prepare amorphous or crystalline Si-B-C-N ceramics. In our experiments we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scal ing and lower deposition temperatures, which are often desirable for practical applications.
  • The new quaternary Si-B-C-N materials attract great interest due to their potential applications in coating technologies and microelectronics. These material s can posses a useful set of properties, such as very high hardness, extremely high temperature resistance, chemical inertness, a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on a chemical vapour deposition at elevated temperatures or on a polymer precursor pyrolysis, were used to prepare amorphous or crystalline Si-B-C-N ceramics. In our experiments we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scal ing and lower deposition temperatures, which are often desirable for practical applications. (en)
Title
  • Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering
  • Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering (en)
skos:prefLabel
  • Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering
  • Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering (en)
skos:notation
  • RIV/49777513:23520/03:00000132!RIV/2004/MSM/235204/N
http://linked.open.../vavai/riv/strany
  • 20-23
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM 235200002)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 610368
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  • RIV/49777513:23520/03:00000132
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  • Si/B/C/N films;magnetron sputtering;elemental composition;mechanical properties;thermal stability (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [92D6C52357A9]
http://linked.open...v/mistoKonaniAkce
  • Brno
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  • Brno
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  • JUNIORMAT '03
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http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Houška, Jiří
  • Vlček, Jaroslav
  • Peřina, Vratislav
  • Potocký, Štěpán
  • Čížek, Jiří
  • Soukup, Zbyněk
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • University of Technology
https://schema.org/isbn
  • 80-214-2462-1
http://localhost/t...ganizacniJednotka
  • 23520
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