Attributes | Values |
---|
rdf:type
| |
Description
| - The new quaternary Si-B-C-N materials attract great interest due to their potential applications in coating technologies and microelectronics. These material s can posses a useful set of properties, such as very high hardness, extremely high temperature resistance, chemical inertness, a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on a chemical vapour deposition at elevated temperatures or on a polymer precursor pyrolysis, were used to prepare amorphous or crystalline Si-B-C-N ceramics. In our experiments we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scal ing and lower deposition temperatures, which are often desirable for practical applications.
- The new quaternary Si-B-C-N materials attract great interest due to their potential applications in coating technologies and microelectronics. These material s can posses a useful set of properties, such as very high hardness, extremely high temperature resistance, chemical inertness, a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on a chemical vapour deposition at elevated temperatures or on a polymer precursor pyrolysis, were used to prepare amorphous or crystalline Si-B-C-N ceramics. In our experiments we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scal ing and lower deposition temperatures, which are often desirable for practical applications. (en)
|
Title
| - Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering
- Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering (en)
|
skos:prefLabel
| - Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering
- Influence of substrate bias voltage on the mechanical properties of Si-B-C-N films prepared by reactive magnetron sputtering (en)
|
skos:notation
| - RIV/49777513:23520/03:00000132!RIV/2004/MSM/235204/N
|
http://linked.open.../vavai/riv/strany
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/03:00000132
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - Si/B/C/N films;magnetron sputtering;elemental composition;mechanical properties;thermal stability (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...v/mistoKonaniAkce
| |
http://linked.open...i/riv/mistoVydani
| |
http://linked.open...i/riv/nazevZdroje
| |
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...ocetUcastnikuAkce
| |
http://linked.open...nichUcastnikuAkce
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...iv/tvurceVysledku
| - Houška, Jiří
- Vlček, Jaroslav
- Peřina, Vratislav
- Potocký, Štěpán
- Čížek, Jiří
- Soukup, Zbyněk
|
http://linked.open...vavai/riv/typAkce
| |
http://linked.open.../riv/zahajeniAkce
| |
http://linked.open...n/vavai/riv/zamer
| |
number of pages
| |
http://purl.org/ne...btex#hasPublisher
| |
https://schema.org/isbn
| |
http://localhost/t...ganizacniJednotka
| |