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  • The new quaternary Si-B-C-N materials attract great interest due to their potential applications in microelectronics and coating technologies. These materials can possess a useful set of properties, such as very highhardness, extremely high temperature resistance chemical inertness , a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on chemical vapour deposition at elevated temperatures or a polymer precursor pyrolysis, were used to prep aramorphous or crystalline Si-B-C-N ceramics. In our experiment we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scalingrad l owedeposition temperatures, which are often desirable for practical applications.
  • The new quaternary Si-B-C-N materials attract great interest due to their potential applications in microelectronics and coating technologies. These materials can possess a useful set of properties, such as very highhardness, extremely high temperature resistance chemical inertness , a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on chemical vapour deposition at elevated temperatures or a polymer precursor pyrolysis, were used to prep aramorphous or crystalline Si-B-C-N ceramics. In our experiment we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scalingrad l owedeposition temperatures, which are often desirable for practical applications. (en)
Title
  • Superhard Si-B-C-N films prepared by reactive magnetron sputtering
  • Superhard Si-B-C-N films prepared by reactive magnetron sputtering (en)
skos:prefLabel
  • Superhard Si-B-C-N films prepared by reactive magnetron sputtering
  • Superhard Si-B-C-N films prepared by reactive magnetron sputtering (en)
skos:notation
  • RIV/49777513:23520/03:00000072!RIV/2004/MSM/235204/N
http://linked.open.../vavai/riv/strany
  • 130-131
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM 235200002)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
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  • 629738
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/03:00000072
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • magnetron sputtering; thin films; superhardness (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [E8E14E0160EB]
http://linked.open...v/mistoKonaniAkce
  • Liptovský Mikuláš
http://linked.open...i/riv/mistoVydani
  • Liptovský Mikuláš
http://linked.open...i/riv/nazevZdroje
  • Proceedings of the XIVth Symposium on Application of Plasma Processes
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
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http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Kormunda, Martin
  • Vlček, Jaroslav
  • Peřina, Vratislav
  • Potocký, Štěpán
  • Čížek, Jiří
  • Soukup, Zbyněk
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • Military Academy
https://schema.org/isbn
  • 80-8040-195-0
http://localhost/t...ganizacniJednotka
  • 23520
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