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Description
| - The new quaternary Si-B-C-N materials attract great interest due to their potential applications in microelectronics and coating technologies. These materials can possess a useful set of properties, such as very highhardness, extremely high temperature resistance chemical inertness , a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on chemical vapour deposition at elevated temperatures or a polymer precursor pyrolysis, were used to prep aramorphous or crystalline Si-B-C-N ceramics. In our experiment we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scalingrad l owedeposition temperatures, which are often desirable for practical applications.
- The new quaternary Si-B-C-N materials attract great interest due to their potential applications in microelectronics and coating technologies. These materials can possess a useful set of properties, such as very highhardness, extremely high temperature resistance chemical inertness , a wide optical transparency window and wide band gap characteristics. Various deposition techniques, mostly based on chemical vapour deposition at elevated temperatures or a polymer precursor pyrolysis, were used to prep aramorphous or crystalline Si-B-C-N ceramics. In our experiment we have used the reactive magnetron sputtering, one of the most versatile techniques compatible with semiconductor technologies. Its further important advantages are an easy up-scalingrad l owedeposition temperatures, which are often desirable for practical applications. (en)
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Title
| - Superhard Si-B-C-N films prepared by reactive magnetron sputtering
- Superhard Si-B-C-N films prepared by reactive magnetron sputtering (en)
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skos:prefLabel
| - Superhard Si-B-C-N films prepared by reactive magnetron sputtering
- Superhard Si-B-C-N films prepared by reactive magnetron sputtering (en)
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skos:notation
| - RIV/49777513:23520/03:00000072!RIV/2004/MSM/235204/N
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/03:00000072
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - magnetron sputtering; thin films; superhardness (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...v/mistoKonaniAkce
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - Proceedings of the XIVth Symposium on Application of Plasma Processes
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...ocetUcastnikuAkce
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http://linked.open...nichUcastnikuAkce
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Kormunda, Martin
- Vlček, Jaroslav
- Peřina, Vratislav
- Potocký, Štěpán
- Čížek, Jiří
- Soukup, Zbyněk
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http://linked.open...vavai/riv/typAkce
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http://linked.open.../riv/zahajeniAkce
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http://linked.open...n/vavai/riv/zamer
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number of pages
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http://purl.org/ne...btex#hasPublisher
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https://schema.org/isbn
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http://localhost/t...ganizacniJednotka
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