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  • Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them.
  • Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them. (en)
Title
  • Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy
  • Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy (en)
skos:prefLabel
  • Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy
  • Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy (en)
skos:notation
  • RIV/49777513:23520/03:00000042!RIV/2004/MSM/235204/N
http://linked.open.../vavai/riv/strany
  • 124-125
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM 235200002)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
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  • 600951
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/03:00000042
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • pulsed magnetron sputtering;optical emission spectroscopy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [670E9C4E4149]
http://linked.open...v/mistoKonaniAkce
  • Liptovský Mikuláš
http://linked.open...i/riv/mistoVydani
  • Liptovský Mikuláš
http://linked.open...i/riv/nazevZdroje
  • Proceedings of the XIVth Symposium on Application of Plasma Processes
http://linked.open...in/vavai/riv/obor
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http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Pajdarová, Andrea Dag
  • Vlček, Jaroslav
  • Bělský, Petr
  • Leština, Jan
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • Military Academy
https://schema.org/isbn
  • 80-8040-195-0
http://localhost/t...ganizacniJednotka
  • 23520
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