Attributes | Values |
---|
rdf:type
| |
Description
| - Vrstvy W-Ti-N byly deponovány technikou reaktivní DC magnetronové depozice. Krystalová struktura, mikrostruktura, složení, tvrdost a zbytkov0 pnutí byly studovány jako funkce parciálního tlaku dusíku. Tyto vrstvy vykazují tvrdost v rozsahu od 25 GPa ( [N]= 0) až do 63 GPa ([N]=25 at.% ) a zbytkové pnutí v rozsahu od -1.3 GPa až do -5.7 GPa. Největší tvrdost byla nalezena ve vrstvách, které splňovaly následující podmínky: (i) přítomnost dvou krystalických fází, (ii) velké mikropnutí , a (iii) relativně nízké tlakové zbytkové pnutí. (cs)
- W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress.
- W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress. (en)
|
Title
| - Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
- Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering (en)
- Složení, struktura, mikrotvrdost a zbytkové pnutí W-Ti-N vrstev deponovaných reaktivním magnetronovým naprašováním (cs)
|
skos:prefLabel
| - Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
- Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering (en)
- Složení, struktura, mikrotvrdost a zbytkové pnutí W-Ti-N vrstev deponovaných reaktivním magnetronovým naprašováním (cs)
|
skos:notation
| - RIV/49777513:23520/02:00000091!RIV07-MSM-23520___
|
http://linked.open.../vavai/riv/strany
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| |
http://linked.open...iv/cisloPeriodika
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/02:00000091
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - hardness; sputtering; nitrides; alloys (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...odStatuVydavatele
| |
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...i/riv/nazevZdroje
| |
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...iv/tvurceVysledku
| - Musil, Jindřich
- Zemek, Josef
- Mišina, Martin
- Shaginyan, L. R.
- Regent, F.
- Britun, V. F.
|
http://linked.open...n/vavai/riv/zamer
| |
issn
| |
number of pages
| |
http://localhost/t...ganizacniJednotka
| |