About: Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering     Goto   Sponge   NotDistinct   Permalink

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Description
  • Vrstvy W-Ti-N byly deponovány technikou reaktivní DC magnetronové depozice. Krystalová struktura, mikrostruktura, složení, tvrdost a zbytkov0 pnutí byly studovány jako funkce parciálního tlaku dusíku. Tyto vrstvy vykazují tvrdost v rozsahu od 25 GPa ( [N]= 0) až do 63 GPa ([N]=25 at.% ) a zbytkové pnutí v rozsahu od -1.3 GPa až do -5.7 GPa. Největší tvrdost byla nalezena ve vrstvách, které splňovaly následující podmínky: (i) přítomnost dvou krystalických fází, (ii) velké mikropnutí , a (iii) relativně nízké tlakové zbytkové pnutí. (cs)
  • W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress.
  • W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress. (en)
Title
  • Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
  • Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering (en)
  • Složení, struktura, mikrotvrdost a zbytkové pnutí W-Ti-N vrstev deponovaných reaktivním magnetronovým naprašováním (cs)
skos:prefLabel
  • Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
  • Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering (en)
  • Složení, struktura, mikrotvrdost a zbytkové pnutí W-Ti-N vrstev deponovaných reaktivním magnetronovým naprašováním (cs)
skos:notation
  • RIV/49777513:23520/02:00000091!RIV07-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 136
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM 235200002)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 641431
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/02:00000091
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • hardness; sputtering; nitrides; alloys (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [429C6771AF00]
http://linked.open...i/riv/nazevZdroje
  • Thin Solid Films
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Zemek, Josef
  • Mišina, Martin
  • Shaginyan, L. R.
  • Regent, F.
  • Britun, V. F.
http://linked.open...n/vavai/riv/zamer
issn
  • 0040-6090
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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