About: Pulsed dc magnetron discharge for high-rate sputtering of this films

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	This article analyzes a pulsed magnetron discharge. Main attention is devoted to the specific behaviour of the pulsed discharge. The time development of pulsed discharge is composed of three regimes of operation: (1) plasma buildup, (2) stationary plasma, and (3) decaying plasma when the pulse power is off. The duration of individual regimes strongly depends on the pulse length t1, the repetition frequency fr of pulses, the power delivered into the discharge, and the operating pressure. The proportion of duration of the regime of plasma buildup to the regime of stationary plasma in the pulse dramatically influences the I-V characteristics of the pulsed discharge and the deposition rate of sputtered films. The I-V characteristics of an unbalanced round planar magnetron with a Cu target 100 mm in diameter are shown. The deposition rate of Cu films sputtered with the pulsed magnetron is also given. This article analyzes a pulsed magnetron discharge. Main attention is devoted to the specific behaviour of the pulsed discharge. The time development of pulsed discharge is composed of three regimes of operation: (1) plasma buildup, (2) stationary plasma, and (3) decaying plasma when the pulse power is off. The duration of individual regimes strongly depends on the pulse length t1, the repetition frequency fr of pulses, the power delivered into the discharge, and the operating pressure. The proportion of duration of the regime of plasma buildup to the regime of stationary plasma in the pulse dramatically influences the I-V characteristics of the pulsed discharge and the deposition rate of sputtered films. The I-V characteristics of an unbalanced round planar magnetron with a Cu target 100 mm in diameter are shown. The deposition rate of Cu films sputtered with the pulsed magnetron is also given. (en)
Title	Pulsed dc magnetron discharge for high-rate sputtering of this films Pulsed dc magnetron discharge for high-rate sputtering of this films (en)
skos:prefLabel	Pulsed dc magnetron discharge for high-rate sputtering of this films Pulsed dc magnetron discharge for high-rate sputtering of this films (en)
skos:notation	RIV/49777513:23520/01:00064883!RIV/2002/GA0/235202/N
http://linked.open.../vavai/riv/strany	s. 420-424
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GV106/96/K245), P(ME 173), Z(MSM 235200002)
http://linked.open...iv/cisloPeriodika	č. 2
http://linked.open...vai/riv/dodaniDat	2002
http://linked.open...aciTvurceVysledku	Tölg, Tomáš Leština, Jan Vlček, Jaroslav Musil, Jindřich
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	693697
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/01:00064883
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Thin films; Pulsed dc magnetron; High-rate sputtering (en)
http://linked.open.../riv/klicoveSlovo	Thin films High-rate sputtering Pulsed dc magnetron
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[87F985B99E53]
http://linked.open...i/riv/nazevZdroje	Journal of Vacuum Science and Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	Hard and superhard coatings prepared by unconventional plasma processes http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20173
http://linked.open...UplatneniVysledku	2001
http://linked.open...v/svazekPeriodika	Vol. 19
http://linked.open...iv/tvurceVysledku	Musil, Jindřich Vlček, Jaroslav Tölg, Tomáš Leština, Jan
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20235200002
issn	0734-2101
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	23520

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