About: Applications of TiO2 thin films with photocatalytic properties deposited by PECVD method with rating cathode     Goto   Sponge   NotDistinct   Permalink

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  • Titanium dioxide thin film has attracted great attention due to its unique properties like photocatalytic activity, optical, electrical and chemical properties making them suitable for many applications such as optical films, antireflection coating for solar cell, sensor material and photocatalytic self-cleaning and waste water purification. This work deals with TiOx thin films deposited by PECVD method in a planar reactor with powered heat-able substrate holder to reach layers with good photocatalytic activity. During process, the cathode was heating in the range 150 – 450°C and oxygen was used as a working gas, and Titan-IV-iso-propoxid as a precursor. The photocatalytic activity was tested using Acid Orange 7 and decomposition speed in contact to TiOx films exposed to UV/VIS light. The photocatalytic activity of the deposited films reached up to 40% of the sedimented P25 powder activity.
  • Titanium dioxide thin film has attracted great attention due to its unique properties like photocatalytic activity, optical, electrical and chemical properties making them suitable for many applications such as optical films, antireflection coating for solar cell, sensor material and photocatalytic self-cleaning and waste water purification. This work deals with TiOx thin films deposited by PECVD method in a planar reactor with powered heat-able substrate holder to reach layers with good photocatalytic activity. During process, the cathode was heating in the range 150 – 450°C and oxygen was used as a working gas, and Titan-IV-iso-propoxid as a precursor. The photocatalytic activity was tested using Acid Orange 7 and decomposition speed in contact to TiOx films exposed to UV/VIS light. The photocatalytic activity of the deposited films reached up to 40% of the sedimented P25 powder activity. (en)
Title
  • Applications of TiO2 thin films with photocatalytic properties deposited by PECVD method with rating cathode
  • Applications of TiO2 thin films with photocatalytic properties deposited by PECVD method with rating cathode (en)
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  • Applications of TiO2 thin films with photocatalytic properties deposited by PECVD method with rating cathode
  • Applications of TiO2 thin films with photocatalytic properties deposited by PECVD method with rating cathode (en)
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  • RIV/46747885:24210/10:#0001619!RIV11-MSM-24210___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1M0577)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...iv/duvernostUdaju
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  • 247547
http://linked.open...ai/riv/idVysledku
  • RIV/46747885:24210/10:#0001619
http://linked.open...riv/jazykVysledku
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  • plasma; titanium dioxide; RF PE CVD (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [6F65CFEA982D]
http://linked.open...v/mistoKonaniAkce
  • Orlando, FL USA
http://linked.open...i/riv/mistoVydani
  • Albuquerque
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  • 53rd Annual Technical Conference Proceedings : Society of Vacuum Coaters
http://linked.open...in/vavai/riv/obor
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http://linked.open...UplatneniVysledku
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  • Špatenka, Petr
  • HORÁKOVÁ, Marta
  • MICHALČÍK, Zdeněk
  • HORSKÁ, I.
  • KLEMENTOVÁ, Š.
  • KŘÍŽ, P.
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
issn
  • 0737-5921
number of pages
http://purl.org/ne...btex#hasPublisher
  • Albuquerque, N.M. : Society of Vacuum Coaters
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  • 24210
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