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  • Aligned CNT have been successfully synthesized from methan, argon and hydrogen mixtures by plasma enhanced hot filament CVD on different thick permalloy, Co or Ni coated silicon substrates at temperatures between 500 and 800 °C.. The electron energy and density of the H2 plasma measured by Langmuir probe and OES techniques was confirmed to play an important role for formation of special structures of the sputtered metal thin films and therefore for the structure and for the adjustment of CNT’s. During the pretreatment etching process the roughness of the surface changed in dependence on plasma power and pretreatment time. Without plasma it is impossible to prepare aligned tubes. Otherwise the plasma power must reached a critical value for formation of aligned structures. The dependence of the plasma parameters on the growth of tubes have been discussed. First results of field emission measurements are discussed, also.
  • Aligned CNT have been successfully synthesized from methan, argon and hydrogen mixtures by plasma enhanced hot filament CVD on different thick permalloy, Co or Ni coated silicon substrates at temperatures between 500 and 800 °C.. The electron energy and density of the H2 plasma measured by Langmuir probe and OES techniques was confirmed to play an important role for formation of special structures of the sputtered metal thin films and therefore for the structure and for the adjustment of CNT’s. During the pretreatment etching process the roughness of the surface changed in dependence on plasma power and pretreatment time. Without plasma it is impossible to prepare aligned tubes. Otherwise the plasma power must reached a critical value for formation of aligned structures. The dependence of the plasma parameters on the growth of tubes have been discussed. First results of field emission measurements are discussed, also. (en)
Title
  • Influence of plasma parameters on growth of carbon nanotubes by plasma enhanced hot filament CVD
  • Influence of plasma parameters on growth of carbon nanotubes by plasma enhanced hot filament CVD (en)
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  • Influence of plasma parameters on growth of carbon nanotubes by plasma enhanced hot filament CVD
  • Influence of plasma parameters on growth of carbon nanotubes by plasma enhanced hot filament CVD (en)
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  • RIV/46747885:24210/02:24210033!RIV/2003/MSM/242103/N
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  • RIV/46747885:24210/02:24210033
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  • %22nanotubes;plasma;CVD%22 (en)
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  • Špatenka, Petr
  • Pácal, František
  • Leonhardt, Albrecht
  • Taeschner, Christine
  • Graff, Andreas
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  • 24210
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