| Attributes | Values |
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| rdf:type
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| Description
| - Byla zkoumána role parametrů během depozice především teploty substrátu na růst křemíkových vrstev. Druhá část prezentovaných výsledků se týkala studia morfologie a složení vrstev připravených několika typy plasmatických reaktorů. Vrstvy byly studovány jadernými analytickými metodami RBS, ERDA a rovněž AFM. Morfologie, složení vrstev a jejich vlastnosti byly diskutovány ve spojitosti s použitím různých typů plasmatických reaktorů. (cs)
- Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour deposition (PECVD) and plasma assisted chemical vapour deposition (PACVD) often used. In this work, we studied the composition and surface morphology of the hexamethyldisiloxane (HMDSO) and tetramethyldisoloxane (TMDSO) layers produced by PECVD and PACVD deposition using three plasma generation processes (plasma reactors): RF inductively coupled plasma (RFICP), microwave distributed electron cyclotron resonance plasma (DECR) and microwave induced remote nitrogen afterlow (MIRA). The layers composition was investigated by Rutherford backscattering spectrometry (RBS) and by elastic recoil detection analysis (ERDA) and the layer surface morphology was determined by atomic force microscopy (AFM). Composition, density and morphology (roughness, porosity) of the
- Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour deposition (PECVD) and plasma assisted chemical vapour deposition (PACVD) often used. In this work, we studied the composition and surface morphology of the hexamethyldisiloxane (HMDSO) and tetramethyldisoloxane (TMDSO) layers produced by PECVD and PACVD deposition using three plasma generation processes (plasma reactors): RF inductively coupled plasma (RFICP), microwave distributed electron cyclotron resonance plasma (DECR) and microwave induced remote nitrogen afterlow (MIRA). The layers composition was investigated by Rutherford backscattering spectrometry (RBS) and by elastic recoil detection analysis (ERDA) and the layer surface morphology was determined by atomic force microscopy (AFM). Composition, density and morphology (roughness, porosity) of the (en)
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| Title
| - Komplexní studium vrstev připravených metodami PECVD a PACVD analytickými metodami RBS, ERDA a AFM. (cs)
- The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD
- The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD (en)
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| skos:prefLabel
| - Komplexní studium vrstev připravených metodami PECVD a PACVD analytickými metodami RBS, ERDA a AFM. (cs)
- The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD
- The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD (en)
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| skos:notation
| - RIV/44555601:13430/04:00002694!RIV/2005/MSM/134305/N
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/44555601:13430/04:00002694
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - silicon;ion scattering spectroscopy;chemical vapour deposition;plasma processing (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...odStatuVydavatele
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
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| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...vavai/riv/projekt
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| http://linked.open...UplatneniVysledku
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| http://linked.open...v/svazekPeriodika
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| http://linked.open...iv/tvurceVysledku
| - Macková, Anna
- Pavlík, Jaroslav
- Švec, Martin
- Granier, A.
- Strýhal, Zdeněk
- Supiot, P.
- Peřina, Václav
- Borvon, G.
- Quede, A.
- Raynaud, P.
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| issn
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| number of pages
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| http://localhost/t...ganizacniJednotka
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