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rdf:type
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Description
| - Thin SnO2 films have wide range of applications (electronics, special coatings, etc.). Mostly, it is used when conductivity and transparency is required or in gas sensors. Tin oxide films of unique properties and of high quality can be prepared usually by techniques such as chemical vapour deposition, spray pyrolysis, evaporation, and sputtering. In this work, we have studied properties of SnO2 thin films produced by a thermal evaporation of Sn films followed by in situ plasma oxidation. The post-deposition analysis of films includes Atomic Force Microscopy (AFM), Rutherford backscattering spectrometry (RBS), Secondary Ion Mass Spectrometry (SIMS).
- Thin SnO2 films have wide range of applications (electronics, special coatings, etc.). Mostly, it is used when conductivity and transparency is required or in gas sensors. Tin oxide films of unique properties and of high quality can be prepared usually by techniques such as chemical vapour deposition, spray pyrolysis, evaporation, and sputtering. In this work, we have studied properties of SnO2 thin films produced by a thermal evaporation of Sn films followed by in situ plasma oxidation. The post-deposition analysis of films includes Atomic Force Microscopy (AFM), Rutherford backscattering spectrometry (RBS), Secondary Ion Mass Spectrometry (SIMS). (en)
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Title
| - Surface Characterization of Tin Oxide Thin Films for Gas Sensors Prepared by Plasma Oxidation
- Surface Characterization of Tin Oxide Thin Films for Gas Sensors Prepared by Plasma Oxidation (en)
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skos:prefLabel
| - Surface Characterization of Tin Oxide Thin Films for Gas Sensors Prepared by Plasma Oxidation
- Surface Characterization of Tin Oxide Thin Films for Gas Sensors Prepared by Plasma Oxidation (en)
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skos:notation
| - RIV/44555601:13430/03:00002342!RIV/2004/MSM/134304/N
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(OC 527.50), Z(MSM 134300001)
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/44555601:13430/03:00002342
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - SnO2, AFNM RBS, plasma oxidation (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...v/mistoKonaniAkce
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - Proceedings of the 14 th Symposium of Application of Plasma Processes
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...ocetUcastnikuAkce
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http://linked.open...nichUcastnikuAkce
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Macková, Anna
- Pavlík, Jaroslav
- Strýhal, Zdeněk
- Peřina, Václav
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http://linked.open...vavai/riv/typAkce
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http://linked.open.../riv/zahajeniAkce
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http://linked.open...n/vavai/riv/zamer
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number of pages
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http://purl.org/ne...btex#hasPublisher
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https://schema.org/isbn
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http://localhost/t...ganizacniJednotka
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