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Description
| - Organosilicon polymers obtained from plasma processes can be used to obtain either barrier properties or to modify their surface energy. The surface sensitivity of such deposits to ageing and plasma or afterglows exposure is of basic interest to understand both the long time scale behaviour of the material and the role of oxidant plasmas on the growth of film then on the resulting surface. Like in polymers such as Polypropylene (PP), Polycarbonate (PC) and Polyimide (PI) and also silicon substrates havebeen covered with deposits resulting from polymerisation involving HMDSO/O2 mixtures in RF diode, RF helicon, microwave DECR or Microwave Induced Remote Afterglow (MIRA) reactors. Composition and morphology of the different films have been analyzed eith er by RBS, ERDA, XPS, SEM and AFM.
- Organosilicon polymers obtained from plasma processes can be used to obtain either barrier properties or to modify their surface energy. The surface sensitivity of such deposits to ageing and plasma or afterglows exposure is of basic interest to understand both the long time scale behaviour of the material and the role of oxidant plasmas on the growth of film then on the resulting surface. Like in polymers such as Polypropylene (PP), Polycarbonate (PC) and Polyimide (PI) and also silicon substrates havebeen covered with deposits resulting from polymerisation involving HMDSO/O2 mixtures in RF diode, RF helicon, microwave DECR or Microwave Induced Remote Afterglow (MIRA) reactors. Composition and morphology of the different films have been analyzed eith er by RBS, ERDA, XPS, SEM and AFM. (en)
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Title
| - Polymer surface modification enhanced by RF and Microwave organosilicon/O2 plasmas
- Polymer surface modification enhanced by RF and Microwave organosilicon/O2 plasmas (en)
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skos:prefLabel
| - Polymer surface modification enhanced by RF and Microwave organosilicon/O2 plasmas
- Polymer surface modification enhanced by RF and Microwave organosilicon/O2 plasmas (en)
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skos:notation
| - RIV/44555601:13430/03:00002336!RIV/2004/MSM/134304/N
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/44555601:13430/03:00002336
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...v/mistoKonaniAkce
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - Proceedings of 16th International Symposium on Plasma Chemistry
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...ocetUcastnikuAkce
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http://linked.open...nichUcastnikuAkce
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Macková, Anna
- Pavlík, Jaroslav
- Granier, A.
- Hnatowicz, V.
- Strýhal, Zdeněk
- Supiot, P.
- Peřina, Václav
- Borvon, G.
- Raynaud, P.
- Boufayed, F.
- Dennler, G.
- Segui, Y.
- Vivien, C.
- Wertheimer, M.
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http://linked.open...vavai/riv/typAkce
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http://linked.open.../riv/zahajeniAkce
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number of pages
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http://purl.org/ne...btex#hasPublisher
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http://localhost/t...ganizacniJednotka
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