About: Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Development of gas sensors in last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their properties and their good perfomance for a detection of oxidable gases. In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of tin films and next plasma oxidation of the metal films. The influence of technological parameters (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate during oxidation) on the surface properties of the oxide films was studied by Atomic Force Microscopy (AFM). Development of gas sensors in last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their properties and their good perfomance for a detection of oxidable gases. In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of tin films and next plasma oxidation of the metal films. The influence of technological parameters (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate during oxidation) on the surface properties of the oxide films was studied by Atomic Force Microscopy (AFM). (en)
Title	Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation (en)
skos:prefLabel	Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation (en)
skos:notation	RIV/44555601:13430/01:00001468!RIV/2002/MSM/134302/N
http://linked.open.../vavai/riv/strany	3279-3284
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(OC 527.50), Z(MSM 134300001)
http://linked.open...vai/riv/dodaniDat	2002
http://linked.open...aciTvurceVysledku	Pavlík, Jaroslav Strýhal, Zdeněk
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Jana Evangelisty Purkyně v Ústí nad Labem / Pedagogická fakulta
http://linked.open...dnocenehoVysledku	697938
http://linked.open...ai/riv/idVysledku	RIV/44555601:13430/01:00001468
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Plasma oxidation, SnO2, AFM, surface roughness (en)
http://linked.open.../riv/klicoveSlovo	surface roughness Plasma oxidation SnO2 AFM
http://linked.open...ontrolniKodProRIV	[65770138D24B]
http://linked.open...v/mistoKonaniAkce	Orléans
http://linked.open...i/riv/mistoVydani	Orléans
http://linked.open...i/riv/nazevZdroje	Symposium proceedings 15th International Symposium on Plasma Chemistry, ISPC - 15
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20527.50
http://linked.open...UplatneniVysledku	2001
http://linked.open...iv/tvurceVysledku	Pavlík, Jaroslav Strýhal, Zdeněk
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2001-07-13 (xsd:date)
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20134300001
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	GREMI, CNRS/University of Orléans
http://localhost/t...ganizacniJednotka	13430

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