About: Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280 nm thick film exhibits only 20% thickness loss after 48 h immersion in water and still contains about 5 at% of the NHx environment. The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280 nm thick film exhibits only 20% thickness loss after 48 h immersion in water and still contains about 5 at% of the NHx environment. (en)
Title	Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water (en)
skos:prefLabel	Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water (en)
skos:notation	RIV/00216305:26620/14:PU109363!RIV15-MSM-26620___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(ED1.1.00/02.0068)
http://linked.open...iv/cisloPeriodika	6
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Polčák, Josef Čechal, Jan
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Středoevropský technologický institut
http://linked.open...dnocenehoVysledku	34952
http://linked.open...ai/riv/idVysledku	RIV/00216305:26620/14:PU109363
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	amine coatings,cyclopropylamine,ESCA/XPS,FT-IR,pulsed discharges (en)
http://linked.open.../riv/klicoveSlovo	amine coatings cyclopropylamine FT-IR ESCA/XPS pulsed discharges
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[3250658CF972]
http://linked.open...i/riv/nazevZdroje	Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Central european institute of technology
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	11
http://linked.open...iv/tvurceVysledku	Eliáš, Marek Nečas, David Zajíčková, Lenka Hnilica, Jaroslav Čechal, Jan Polčák, Josef Manakhov, Anton Bittnerová, Štěpánka
issn	1612-8850
number of pages	13 (xsd:int)
http://localhost/t...ganizacniJednotka	26620

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