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  • Glass frit bonding technology provides a wide range of possibilities for the bonding of wafers at process temperatures below 450 C. The process consists of three main steps: screen-printing of the glass paste, thermal conditioning and thermo-compressive bonding. The structured bonding layer protects moveable structures from parasitic bonding. Almost all surface layers commonly used in silicon micromachining can be bonded using glass frits. The main advantages of glass frit bonding are hermetic sealing, high process yield, low mechanical stress at the bonding interface, high bonding strength, and good reliability.
  • Glass frit bonding technology provides a wide range of possibilities for the bonding of wafers at process temperatures below 450 C. The process consists of three main steps: screen-printing of the glass paste, thermal conditioning and thermo-compressive bonding. The structured bonding layer protects moveable structures from parasitic bonding. Almost all surface layers commonly used in silicon micromachining can be bonded using glass frits. The main advantages of glass frit bonding are hermetic sealing, high process yield, low mechanical stress at the bonding interface, high bonding strength, and good reliability. (en)
Title
  • Experimental study of glass frit bonding
  • Experimental study of glass frit bonding (en)
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  • Experimental study of glass frit bonding
  • Experimental study of glass frit bonding (en)
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  • RIV/00216305:26620/12:PU98794!RIV13-GA0-26620___
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  • P(GA102/09/1601), P(GAP205/10/1374), S
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  • 135633
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  • RIV/00216305:26620/12:PU98794
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  • Glass frit, wafer bonding (en)
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  • [FCF6F2EEB32F]
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  • Brno
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  • Brno
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  • XII. Pracovní setkání fyzikálních chemiků a elektrochemiků
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  • Chomoucká, Jana
  • Pekárek, Jan
  • Prášek, Jan
  • Vrba, Radimír
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  • Mendelova zemědělská a lesnická univerzita v Brně
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  • 978-80-7375-618-5
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  • 26620
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