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  • The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.
  • The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling. (en)
  • The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling. (cs)
Title
  • Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.
  • Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů. (cs)
  • Methods of surface and thin film analysisof chemical composition, photoelectron diffraction (en)
skos:prefLabel
  • Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.
  • Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů. (cs)
  • Methods of surface and thin film analysisof chemical composition, photoelectron diffraction (en)
skos:notation
  • RIV/00216305:26620/11:PU97268!RIV12-MSM-26620___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(LC06040), Z(MSM0021630508)
http://linked.open...iv/cisloPeriodika
  • 18
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 212105
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26620/11:PU97268
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • XPS, AES, SIMS, photoelectron spectroscopy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [7C07AE6DA5E1]
http://linked.open...i/riv/nazevZdroje
  • Materials Structure
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 2011
http://linked.open...iv/tvurceVysledku
  • Mašek, Karel
  • Bábor, Petr
http://linked.open...n/vavai/riv/zamer
issn
  • 1211-5894
number of pages
http://localhost/t...ganizacniJednotka
  • 26620
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