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  • This contribution focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). Mixture of Hexamethyldisiloxane with oxygen was used as a precursor of plasmachemical reactions. The parylene thin films were prepared by standard CVD technique. The coatings were characterized by various methods in order to obtain information about their thickness (ellipsometry), chemical structure (FTIR) and elemental composition (XPS), surface morphology (LCSM, SEM) and barrier properties (OTR). Standard corrosion tests were performed to determine the effectiveness of corrosion protection. The results were compared with those on samples treated by conventional conservation procedures.
  • This contribution focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). Mixture of Hexamethyldisiloxane with oxygen was used as a precursor of plasmachemical reactions. The parylene thin films were prepared by standard CVD technique. The coatings were characterized by various methods in order to obtain information about their thickness (ellipsometry), chemical structure (FTIR) and elemental composition (XPS), surface morphology (LCSM, SEM) and barrier properties (OTR). Standard corrosion tests were performed to determine the effectiveness of corrosion protection. The results were compared with those on samples treated by conventional conservation procedures. (en)
Title
  • Protection of Archaeological Artefacts by Deposition of Parylene and SiOx Thin Films
  • Protection of Archaeological Artefacts by Deposition of Parylene and SiOx Thin Films (en)
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  • Protection of Archaeological Artefacts by Deposition of Parylene and SiOx Thin Films
  • Protection of Archaeological Artefacts by Deposition of Parylene and SiOx Thin Films (en)
skos:notation
  • RIV/00216305:26310/12:PU99243!RIV13-MSM-26310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(DF11P01OVV004), S
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 163037
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/12:PU99243
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  • SiOx plasma deposition, parylene films, barriere properties (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [90FFB7F2FA58]
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Horák, Jakub
  • Krčma, František
  • Přikryl, Radek
  • Balaštíková, Radka
  • Procházka, Michal
  • Menčík, Přemysl
http://localhost/t...ganizacniJednotka
  • 26310
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