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  • This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of the method 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured.
  • This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of the method 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured. (en)
Title
  • Thickness measurement of thin soft organic films
  • Thickness measurement of thin soft organic films (en)
skos:prefLabel
  • Thickness measurement of thin soft organic films
  • Thickness measurement of thin soft organic films (en)
skos:notation
  • RIV/00216305:26310/12:PU103402!RIV15-MSM-26310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • O, P(ED0012/01/01)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
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  • 174343
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/12:PU103402
http://linked.open...riv/jazykVysledku
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  • This soft organic films , Interference microscopy , Semiconductor device measurement , Surface morphology , Thickness measurement (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [66EFEFD8284A]
http://linked.open...v/mistoKonaniAkce
  • Bad Aussee
http://linked.open...i/riv/mistoVydani
  • Bad Aussee, Austria
http://linked.open...i/riv/nazevZdroje
  • Electronics Technology (ISSE), 2012 35th International Spring Seminar on
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Mladenova, Daniela
  • Salyk, Ota
  • Weiter, Martin
  • Zhivkov, Ivaylo
  • Ohlídal, Miloslav
  • Siderov, Vasil
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
number of pages
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  • Neuveden
https://schema.org/isbn
  • 978-1-4673-2241-6
http://localhost/t...ganizacniJednotka
  • 26310
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