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  • This study is aimed at the basic research of plasma polymer films and an influence of deposition conditions on structure and properties of single-layer films and multilayers prepared by PE CVD method. Single layer and multilayered a-SiC:H films were deposited on silicon wafers from tetravinylsilane monomer (TVS) at different powers in continual and pulse regimes. The films were investigated extensively by spectroscopic ellipsometry, nanoindentation, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), Rutherford Backscattering Spectrometry (RBS), X-ray reflectivity, Fourier Transform Infrared Spectroscopy (FTIR) and contact angle measurements to observe their optical, mechanical and chemical properties. The influence of the deposition condition on the physicochemical properties of pp-TVS films was revealed and quantified. Single layers were also exposed to UV light as post-deposition treatment to investigate aging effects and the influence of UV irradiation on their physical and chem
  • This study is aimed at the basic research of plasma polymer films and an influence of deposition conditions on structure and properties of single-layer films and multilayers prepared by PE CVD method. Single layer and multilayered a-SiC:H films were deposited on silicon wafers from tetravinylsilane monomer (TVS) at different powers in continual and pulse regimes. The films were investigated extensively by spectroscopic ellipsometry, nanoindentation, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), Rutherford Backscattering Spectrometry (RBS), X-ray reflectivity, Fourier Transform Infrared Spectroscopy (FTIR) and contact angle measurements to observe their optical, mechanical and chemical properties. The influence of the deposition condition on the physicochemical properties of pp-TVS films was revealed and quantified. Single layers were also exposed to UV light as post-deposition treatment to investigate aging effects and the influence of UV irradiation on their physical and chem (en)
Title
  • NANOLAYERED COMPOSITES
  • NANOLAYERED COMPOSITES (en)
skos:prefLabel
  • NANOLAYERED COMPOSITES
  • NANOLAYERED COMPOSITES (en)
skos:notation
  • RIV/00216305:26310/11:PU96928!RIV13-AV0-26310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GD104/09/H080), P(KAN101120701), P(ME09061)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 214780
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/11:PU96928
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • plasma polymerization, multilayers, tetravinylsilane, thin films, ellipsometry (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [1F0C86351344]
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Kontárová, Soňa
http://localhost/t...ganizacniJednotka
  • 26310
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