About: Mechanical properties of individual layers in a-SiC:H multilayer film

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Hydrogenated amorphous carbon-silicon (a-SiC:H) multilayer film consisting of five soft bilayers (layer A: E=15.4 GPa, H=1.69 GPa; layer B: E=9.63 GPa, H=0.94 GPa) was deposited from tetravinylsilane monomer at two RF powers (10 W, 0.1 W) on silicon wafer by plasma-enhanced chemical vapor deposition. The multilayer comprising ten layers of 0.13-micron thickness was sectioned at a shallow angle of 4 deg by ultramicrotomy to reveal the individual layers. The layers in the multilayer film were distinguished by the surface topography mode of semicontact atomic force microscopy utilizing the step character in height corresponding to the stiffness of the individual layers and by atomic force acoustic microscopy (AFAM) utilizing the distribution of resonant frequencies corresponding to elastic anisotropy. The sectioned individual layers were sufficiently smooth (RMS roughness: 0.001 micron) to make nanoindentation measurements for each layer. The Youngs modulus E and hardness H were determined for individual Hydrogenated amorphous carbon-silicon (a-SiC:H) multilayer film consisting of five soft bilayers (layer A: E=15.4 GPa, H=1.69 GPa; layer B: E=9.63 GPa, H=0.94 GPa) was deposited from tetravinylsilane monomer at two RF powers (10 W, 0.1 W) on silicon wafer by plasma-enhanced chemical vapor deposition. The multilayer comprising ten layers of 0.13-micron thickness was sectioned at a shallow angle of 4 deg by ultramicrotomy to reveal the individual layers. The layers in the multilayer film were distinguished by the surface topography mode of semicontact atomic force microscopy utilizing the step character in height corresponding to the stiffness of the individual layers and by atomic force acoustic microscopy (AFAM) utilizing the distribution of resonant frequencies corresponding to elastic anisotropy. The sectioned individual layers were sufficiently smooth (RMS roughness: 0.001 micron) to make nanoindentation measurements for each layer. The Youngs modulus E and hardness H were determined for individual (en)
Title	Mechanical properties of individual layers in a-SiC:H multilayer film Mechanical properties of individual layers in a-SiC:H multilayer film (en)
skos:prefLabel	Mechanical properties of individual layers in a-SiC:H multilayer film Mechanical properties of individual layers in a-SiC:H multilayer film (en)
skos:notation	RIV/00216305:26310/11:PU96913!RIV13-AV0-26310___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GAP106/11/0738), P(KAN101120701), P(ME09061)
http://linked.open...iv/cisloPeriodika	12
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Čech, Vladimír Škoda, David Trivedi, Rutul Rajendra
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta chemická
http://linked.open...dnocenehoVysledku	211245
http://linked.open...ai/riv/idVysledku	RIV/00216305:26310/11:PU96913
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	atomic force microscopy (AFM), mechanical properties, multilayers, nanoindentation, plasma-enhanced chemical vapor deposition (PECVD) (en)
http://linked.open.../riv/klicoveSlovo	mechanical properties nanoindentation multilayers atomic force microscopy (AFM) plasma-enhanced chemical vapor deposition (PECVD)
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[23534A31E86B]
http://linked.open...i/riv/nazevZdroje	Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor	CF
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...vavai/riv/projekt	Plasmachemical processing of fibrous reinforcements for high-performance polymer composites Nanocomposite films and nanoparticles prepared in low pressure plasma for surface modifications Developoment of functional interlayers for polymer composites with controlled interphase
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	8
http://linked.open...iv/tvurceVysledku	Čech, Vladimír Trivedi, Rutul Rajendra Škoda, David
issn	1612-8850
number of pages	9 (xsd:int)
http://localhost/t...ganizacniJednotka	26310

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