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  • Silicon-based plasma polymer films were deposited on planar glass substrates from vinyltriethoxysilane monomer and tetravinylsilane in a mixture with oxygen gas employing RF (13.56 MHz) pulsed plasma. The wettability of the deposited films was investigated by the sessile drop method, and the surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method, the Wu harmonic mean method, and van Oss, Chaudhury, and Good acid-base theory. The surface free energy ranging from 33 to 45 mJ m-2 may be controlled by the effective power in the case of plasma-polymerized films of vinyltriethoxysilane. An improved wettability was obtained for plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas, where the surface free energy was in the range 41 - 58 mJ m-2 and may be controlled by the power and the amount of oxygen in the mixture. Chemical analyses of the films showed a rough correlation between the surface free energy and chemical species at th
  • Silicon-based plasma polymer films were deposited on planar glass substrates from vinyltriethoxysilane monomer and tetravinylsilane in a mixture with oxygen gas employing RF (13.56 MHz) pulsed plasma. The wettability of the deposited films was investigated by the sessile drop method, and the surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method, the Wu harmonic mean method, and van Oss, Chaudhury, and Good acid-base theory. The surface free energy ranging from 33 to 45 mJ m-2 may be controlled by the effective power in the case of plasma-polymerized films of vinyltriethoxysilane. An improved wettability was obtained for plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas, where the surface free energy was in the range 41 - 58 mJ m-2 and may be controlled by the power and the amount of oxygen in the mixture. Chemical analyses of the films showed a rough correlation between the surface free energy and chemical species at th (en)
Title
  • Surface free energy of silicon-based plasma polymer films
  • Surface free energy of silicon-based plasma polymer films (en)
skos:prefLabel
  • Surface free energy of silicon-based plasma polymer films
  • Surface free energy of silicon-based plasma polymer films (en)
skos:notation
  • RIV/00216305:26310/09:PU84425!RIV10-MSM-26310___
http://linked.open...avai/riv/aktivita
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  • P(1P05OC087), P(GA104/06/0437), P(KAN101120701)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 344764
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/09:PU84425
http://linked.open...riv/jazykVysledku
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  • wettability, surface free energy, thin film, organosilicon, plasma polymerization (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [176CF93CE42C]
http://linked.open...i/riv/mistoVydani
  • Neuveden
http://linked.open...vEdiceCisloSvazku
  • VSP
http://linked.open...i/riv/nazevZdroje
  • Silanes and other coupling agents
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http://linked.open...ichTvurcuVysledku
http://linked.open...v/pocetStranKnihy
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Studýnka, Jan
  • Čech, Vladimír
  • Sova, Jiří
  • Lichovníková, Soňa
number of pages
http://purl.org/ne...btex#hasPublisher
  • Neuveden
https://schema.org/isbn
  • 978-90-04-16591-5
http://localhost/t...ganizacniJednotka
  • 26310
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