About: Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas

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About: Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Vliv kyslíku na chemickou strukturu vrstev plazmového polymeru deponovaného ze směsi tetravinylsilanu a kyslíku (cs) Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and the results clarified changes in chemical structure of films under influence of oxygen. Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and the results clarified changes in chemical structure of films under influence of oxygen. (en)
Title	Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas (en) Vliv kyslíku na chemickou strukturu vrstev plazmového polymeru deponovaného ze směsi tetravinylsilanu a kyslíku (cs)
skos:prefLabel	Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas (en) Vliv kyslíku na chemickou strukturu vrstev plazmového polymeru deponovaného ze směsi tetravinylsilanu a kyslíku (cs)
skos:notation	RIV/00216305:26310/07:PU70622!RIV08-GA0-26310___
http://linked.open.../vavai/riv/strany	776-780
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(1P05OC087), P(GA104/06/0437)
http://linked.open...iv/cisloPeriodika	S1
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Peřina, Vratislav Čech, Vladimír Studýnka, Jan Janoš, Filip
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta chemická
http://linked.open...dnocenehoVysledku	426327
http://linked.open...ai/riv/idVysledku	RIV/00216305:26310/07:PU70622
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Glow discharge mass spectroscopy (GDMS), Infrared spectroscopy, Rutherford backscattering spectroscopy, PACVD, Plasma polymer (en)
http://linked.open.../riv/klicoveSlovo	Rutherford backscattering spectroscopy PACVD Plasma polymer Infrared spectroscopy Glow discharge mass spectroscopy (GDMS)
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[856ACBE806DE]
http://linked.open...i/riv/nazevZdroje	Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor	CF
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Structuring of plasma polymers Progress in plasmachemical processes for the development of smart polymer nanostructures
http://linked.open...UplatneniVysledku	2007
http://linked.open...v/svazekPeriodika	4
http://linked.open...iv/tvurceVysledku	Studýnka, Jan Čech, Vladimír Peřina, Vratislav Janoš, Filip
issn	1612-8850
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	26310

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