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Description
| - Chemické a fyzikální vlastnosti plazmových polymerů byly konfrontovány s vlastnostmi polykondenzovaných vrstev připravených ze stejného monomeru - vinyltriethoxysilanu. (cs)
- Plasma-polymerized and polycondensed thin films of vinyltriethoxysilane were deposited on planar glass substrates and glass fibers using plasma-enhanced chemical vapor deposition and a wet chemical process. Deposited films were extensively characterized by microscopic and spectroscopic techniques and indentation tests in order to compare their elemental composition, chemical structure, wettability, elastic modulus, hardness, and adhesion. The physicochemical properties of the polycondensed films were invariable, while those of the plasma-polymerized films could be varied in relatively wide ranges by altering the deposition conditions.
- Plasma-polymerized and polycondensed thin films of vinyltriethoxysilane were deposited on planar glass substrates and glass fibers using plasma-enhanced chemical vapor deposition and a wet chemical process. Deposited films were extensively characterized by microscopic and spectroscopic techniques and indentation tests in order to compare their elemental composition, chemical structure, wettability, elastic modulus, hardness, and adhesion. The physicochemical properties of the polycondensed films were invariable, while those of the plasma-polymerized films could be varied in relatively wide ranges by altering the deposition conditions. (en)
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Title
| - Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane
- Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane (en)
- Plazmové polymery versusu polykondenzované tenké vrstvy připravené z vinyltriethoxysilanu (cs)
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skos:prefLabel
| - Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane
- Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane (en)
- Plazmové polymery versusu polykondenzované tenké vrstvy připravené z vinyltriethoxysilanu (cs)
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skos:notation
| - RIV/00216305:26310/06:PU63297!RIV07-MSM-26310___
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(GA104/03/0236), P(ME 597), P(OC 527.110), Z(AV0Z10100521)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/00216305:26310/06:PU63297
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Chemical vapor deposition, Plasma processing and deposition, Organosilicon (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - US - Spojené státy americké
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Přikryl, Radek
- Vaněk, Jan
- Čech, Vladimír
- Zemek, Josef
- Burešová, Alena
- Inagaki, Norihiro
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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http://localhost/t...ganizacniJednotka
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