About: Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharrge parameters and the final layer properties will be subject of the following studies. The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharrge parameters and the final layer properties will be subject of the following studies. (en)
Title	Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films (en)
skos:prefLabel	Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films (en)
skos:notation	RIV/00216305:26310/03:PU38240!RIV/2004/MSM/263104/N
http://linked.open.../vavai/riv/strany	222-223
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM 263100019)
http://linked.open...vai/riv/dodaniDat	2004
http://linked.open...aciTvurceVysledku	Vaněk, Jan Kolářová Rašková, Zuzana Přikryl, Radek Šormová, Hana Čech, Vladimír Burianová, Iveta Krčma, František
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta chemická
http://linked.open...dnocenehoVysledku	628166
http://linked.open...ai/riv/idVysledku	RIV/00216305:26310/03:PU38240
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Plasma deposition, organosilikone layers, optical emission spectroscopy (en)
http://linked.open.../riv/klicoveSlovo	Plasma deposition optical emission spectroscopy organosilikone layers
http://linked.open...ontrolniKodProRIV	[535AD4DE9573]
http://linked.open...v/mistoKonaniAkce	Bobrovník
http://linked.open...i/riv/mistoVydani	Bratislava
http://linked.open...i/riv/nazevZdroje	Proceedings of 14th Symposium on Application of Plasma Processes
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...UplatneniVysledku	2003
http://linked.open...iv/tvurceVysledku	Krčma, František Přikryl, Radek Vaněk, Jan Čech, Vladimír Rašková, Zuzana Šormová, Hana Havelková, Iveta
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2003-01-13 (xsd:date)
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20263100019
number of pages	2 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Slovenská akadémia vied
https://schema.org/isbn	80-8040-195-0
http://localhost/t...ganizacniJednotka	26310

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