About: Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films     Goto   Sponge   NotDistinct   Permalink

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Description
  • The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharrge parameters and the final layer properties will be subject of the following studies.
  • The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharrge parameters and the final layer properties will be subject of the following studies. (en)
Title
  • Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films
  • Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films (en)
skos:prefLabel
  • Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films
  • Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films (en)
skos:notation
  • RIV/00216305:26310/03:PU38239!RIV/2004/MSM/263104/N
http://linked.open.../vavai/riv/strany
  • 401-405
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM 263100019)
http://linked.open...iv/cisloPeriodika
  • 5
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 628163
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/03:PU38239
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Plasma deposition, organosilicone layers, optical emission spectroscopy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • SK - Slovenská republika
http://linked.open...ontrolniKodProRIV
  • [974BA1EF69C5]
http://linked.open...i/riv/nazevZdroje
  • Acta Physica Slovaca
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...ocetUcastnikuAkce
http://linked.open...nichUcastnikuAkce
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 53
http://linked.open...iv/tvurceVysledku
  • Krčma, František
  • Přikryl, Radek
  • Vaněk, Jan
  • Čech, Vladimír
  • Rašková, Zuzana
  • Šormová, Hana
  • Havelková, Iveta
http://linked.open...n/vavai/riv/zamer
issn
  • 0323-0465
number of pages
http://localhost/t...ganizacniJednotka
  • 26310
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