About: Electron Density, RTS Noise and Temperature Measurement of Submicron MOSFETs     Goto   Sponge   NotDistinct   Permalink

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  • We compare two models of charge carrier capture and emission in silicon MOSFET, which is a source of RTS noise. In the SiO2 gate insulating layer and its interface with Si channel there is a high number of oxygen vacancies, creating localised states and traps. Electron exchange between channel and traps within several nanometers distance is given by tunnelling processes and leads to generation of 1/f noise. Two possible mechanisms of electron tunnelling are discussed and theoretical results are compared to experimental dependence of capture and emission parameters as a function of gate and drain voltage (electric field intensity) and temperature.
  • We compare two models of charge carrier capture and emission in silicon MOSFET, which is a source of RTS noise. In the SiO2 gate insulating layer and its interface with Si channel there is a high number of oxygen vacancies, creating localised states and traps. Electron exchange between channel and traps within several nanometers distance is given by tunnelling processes and leads to generation of 1/f noise. Two possible mechanisms of electron tunnelling are discussed and theoretical results are compared to experimental dependence of capture and emission parameters as a function of gate and drain voltage (electric field intensity) and temperature. (en)
Title
  • Electron Density, RTS Noise and Temperature Measurement of Submicron MOSFETs
  • Electron Density, RTS Noise and Temperature Measurement of Submicron MOSFETs (en)
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  • Electron Density, RTS Noise and Temperature Measurement of Submicron MOSFETs
  • Electron Density, RTS Noise and Temperature Measurement of Submicron MOSFETs (en)
skos:notation
  • RIV/00216305:26220/10:PU86944!RIV11-GA0-26220___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GD102/09/H074), Z(MSM0021630503)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...iv/duvernostUdaju
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  • 256749
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26220/10:PU86944
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Electron Density, RTS Noise, 1/f noise, Cryogenic Measurement, MOSFET (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [29F624B8B640]
http://linked.open...v/mistoKonaniAkce
  • Kyoto
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  • Koszykowa 75 00 662 Warsaw Poland
http://linked.open...i/riv/nazevZdroje
  • Polymer Electronics and Nanotechnologies: towards System Integration
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Pavelka, Jan
  • Šikula, Josef
  • Chvátal, Miloš
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • Piotr Firek, Ryszard Kisiel
https://schema.org/isbn
  • 978-83-7207-874-2
http://localhost/t...ganizacniJednotka
  • 26220
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