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  • Experiments were carried out for n-channel CMOS technology. Electron concentration in the channel decreases linearly from the source to the drain contact. Diffusion current component is independent on the x-coordinate and it is equal to the drift current component for the low electric field. Lateral component of the electric field intensity is inhomogeneous in the channel and it has a minimum value near the source contact and increases with the distance from the source to the drain. It reaches maximum value near the drain electrode.
  • Experiments were carried out for n-channel CMOS technology. Electron concentration in the channel decreases linearly from the source to the drain contact. Diffusion current component is independent on the x-coordinate and it is equal to the drift current component for the low electric field. Lateral component of the electric field intensity is inhomogeneous in the channel and it has a minimum value near the source contact and increases with the distance from the source to the drain. It reaches maximum value near the drain electrode. (en)
  • Experiments were carried out for n-channel CMOS technology. Electron concentration in the channel decreases linearly from the source to the drain contact. Diffusion current component is independent on the x-coordinate and it is equal to the drift current component for the low electric field. Lateral component of the electric field intensity is inhomogeneous in the channel and it has a minimum value near the source contact and increases with the distance from the source to the drain. It reaches maximum value near the drain electrode. (cs)
Title
  • IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS
  • IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS (en)
  • IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS (cs)
skos:prefLabel
  • IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS
  • IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS (en)
  • IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS (cs)
skos:notation
  • RIV/00216305:26220/09:PU81999!RIV10-MSM-26220___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA102/09/1920), P(GD102/09/H074), Z(MSM0021630503)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 318817
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26220/09:PU81999
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • VA characteristic, MOSFET, electron density, diffusion current, drift current (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [29497F745A7E]
http://linked.open...v/mistoKonaniAkce
  • Brno
http://linked.open...i/riv/mistoVydani
  • Nám. Republiky 15 Brno
http://linked.open...i/riv/nazevZdroje
  • Electronic Devices and Systems EDS'09 IMAPS CS International Conference 2009
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Sedláková, Vlasta
  • Šikula, Josef
  • Chvátal, Miloš
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • NOVPRESS s.r.o.
https://schema.org/isbn
  • 978-80-214-3933-7
http://localhost/t...ganizacniJednotka
  • 26220
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