About: Interface Resistance between Polymer Based Conducting and Resistive Layers

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	We have studied the interface resistance between the polymer based conducting and resistive thick film layers. The samples were made using different resistive pastes and dipping silvers. The composite of carbon and graphite (C/Gr) conducting particles suspended in different polymer vehicles were used for the thick film resistive layers preparation. Interface resistance RI created between the contact layer made from dipping silver (DiAg) and resistive layer was determined from the surface potential distribution measurements and its value was less than 1% of total sample resistance. Measuring apparatus DISPOT designed in our laboratory provides the measuring of a surface potential distribution. The measuring probe is sliding on the surface of measured structure and potential change between the successive steps is normalized by the total current flowing through the structure. Elementary step (the shortest distance between two measurements) is 1.25 m. The equipment is arranged for current and voltage fou We have studied the interface resistance between the polymer based conducting and resistive thick film layers. The samples were made using different resistive pastes and dipping silvers. The composite of carbon and graphite (C/Gr) conducting particles suspended in different polymer vehicles were used for the thick film resistive layers preparation. Interface resistance RI created between the contact layer made from dipping silver (DiAg) and resistive layer was determined from the surface potential distribution measurements and its value was less than 1% of total sample resistance. Measuring apparatus DISPOT designed in our laboratory provides the measuring of a surface potential distribution. The measuring probe is sliding on the surface of measured structure and potential change between the successive steps is normalized by the total current flowing through the structure. Elementary step (the shortest distance between two measurements) is 1.25 m. The equipment is arranged for current and voltage fou (en)
Title	Interface Resistance between Polymer Based Conducting and Resistive Layers Interface Resistance between Polymer Based Conducting and Resistive Layers (en)
skos:prefLabel	Interface Resistance between Polymer Based Conducting and Resistive Layers Interface Resistance between Polymer Based Conducting and Resistive Layers (en)
skos:notation	RIV/00216305:26220/09:PU81660!RIV10-MSM-26220___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GD102/09/H074), Z(MSM0021630503)
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Tofel, Pavel Majzner, Jiří Sedláková, Vlasta Chvátal, Miloš
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta elektrotechniky a komunikačních technologií
http://linked.open...dnocenehoVysledku	320011
http://linked.open...ai/riv/idVysledku	RIV/00216305:26220/09:PU81660
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	interface resistance, 1/f noise, non-linearity, polymer based TFR (en)
http://linked.open.../riv/klicoveSlovo	non-linearity 1/f noise interface resistance polymer based TFR
http://linked.open...ontrolniKodProRIV	[92C7E04D3025]
http://linked.open...v/mistoKonaniAkce	Rimini
http://linked.open...i/riv/mistoVydani	Italie
http://linked.open...i/riv/nazevZdroje	17th European Microelectronics and Packaging Conference & Exhibition
http://linked.open...in/vavai/riv/obor	BE
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Diagnostics of material defects using the latest defectoscopic methods
http://linked.open...UplatneniVysledku	2009
http://linked.open...iv/tvurceVysledku	Majzner, Jiří Sedláková, Vlasta Tofel, Pavel Chvátal, Miloš
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2009-06-15 (xsd:date)
http://linked.open...n/vavai/riv/zamer	Nové trendy v mikroelektronických systémech a nanotechnologiích (MIKROSYN)
number of pages	4 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Neuveden
https://schema.org/isbn	978-1-4244-4722-0
http://localhost/t...ganizacniJednotka	26220

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