| Attributes | Values |
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| rdf:type
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| Description
| - V poslední době existuje velký zájem o porézní oxid hlinitý, pro jeho schopnost samouspořádaní a tvorbu pravidelných hexagonálních struktur. Využití tohoto materiálu je použití jako šablony pro tvorbu elektronických optoelektronických a magnetických nanostruktur. Hlavní myšlenkou této metody je příprava šablony pro elektrodepozice nanostruktur přímo na křemíkovém substrátu. Pro mikroelektronický průmysl je využití této technologie oproti elektronové litografii mnohem levnější. Anodizovaný porézní oxid hlinitý byl vyroben pomocí řízenou chemickou oxidací v několika typech elektrolytů a byly popsány strukturní charakteristiky pro různé podmínky anodizace. Velikost anodizované hliníkové vrstvy je 1 - 2 um. Pro depozici hliníkové vrstvy na Si substrát jsou použity 2 metody vakuové napařování a magnetronové naprašování. Póry vytvořené oxidové struktury mají průměry v rozmezí 15 - 30 nm a jejich jednotlivé vzdálenosti jsou 30 (cs)
- The porous alumina attracts attention because of its self-ordered hexagonal structure. It can be used as a template nanosize structure, for many devices such as magnetic, electronic and optoelectronic. The aim of this method is preparation of the mask for electrodepositing nanowires directly on Si substrate. The presented technique without utilization of high-resolution electron-beam lithographs belongs to low-cost technology in the microelectronic industry. Anodic alumina has been prepared in several electrolytes by the anodization process and the characteristics of pore structures have been studied in different anodizing conditions. The thickness of aluminum film for anodization was 1-2 um. The two methods for deposition of aluminum thin film on Si substrate are thermal evaporating and sputtering. The prepared alumina structures have 15-30 nm pore diameters and 30-110 nm interpore distances. The anodization of thin alumina film deposited on Si substrate is a complicated process in comparison with
- The porous alumina attracts attention because of its self-ordered hexagonal structure. It can be used as a template nanosize structure, for many devices such as magnetic, electronic and optoelectronic. The aim of this method is preparation of the mask for electrodepositing nanowires directly on Si substrate. The presented technique without utilization of high-resolution electron-beam lithographs belongs to low-cost technology in the microelectronic industry. Anodic alumina has been prepared in several electrolytes by the anodization process and the characteristics of pore structures have been studied in different anodizing conditions. The thickness of aluminum film for anodization was 1-2 um. The two methods for deposition of aluminum thin film on Si substrate are thermal evaporating and sputtering. The prepared alumina structures have 15-30 nm pore diameters and 30-110 nm interpore distances. The anodization of thin alumina film deposited on Si substrate is a complicated process in comparison with (en)
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| Title
| - Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique
- Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique (en)
- Použití tenkovrstevného porézního Al2O3 jako šablony pro tvorbu poravidelně uspořádaných nanostruktur (cs)
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| skos:prefLabel
| - Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique
- Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique (en)
- Použití tenkovrstevného porézního Al2O3 jako šablony pro tvorbu poravidelně uspořádaných nanostruktur (cs)
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| skos:notation
| - RIV/00216305:26220/07:PU69510!RIV08-GA0-26220___
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
| |
| http://linked.open...avai/riv/aktivity
| - P(GP102/04/P162), Z(MSM 262200022)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
| |
| http://linked.open...aciTvurceVysledku
| |
| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
| |
| http://linked.open...dnocenehoVysledku
| |
| http://linked.open...ai/riv/idVysledku
| - RIV/00216305:26220/07:PU69510
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| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - pore alumina, anodization, sputtered, nanocrystal (en)
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| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
| |
| http://linked.open...ontrolniKodProRIV
| |
| http://linked.open...i/riv/nazevZdroje
| - Acta Metallurgica Slovaca
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| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
| |
| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...vavai/riv/projekt
| |
| http://linked.open...UplatneniVysledku
| |
| http://linked.open...v/svazekPeriodika
| |
| http://linked.open...iv/tvurceVysledku
| - Hubálek, Jaromír
- Hrdý, Radim
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| http://linked.open...n/vavai/riv/zamer
| |
| issn
| |
| number of pages
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| http://localhost/t...ganizacniJednotka
| |
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