About: Pulse power supply for magnetron sputtering.

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Byl sestaven pulsní zdroj pro magnetronové naprašování. Maximální výkon je 750 W s možností okamžitého výkonu v pulsu až 3 kW. Monitorování napětí a proudu katody magnetronu prokázalo, že na počátku každého napájecího pulsu je přechodový děj, ve kterám vznikají elektrony s velkou energií. Po odeznění přechodového děje se velikost energie elektronů v objemu plazmatu přibližuje hodnotě, která odpovídá stejnosměrnému napájení. (cs) An experimental pulse power supply source for magnetron pulse sputtering has been designed and built. The mean power is 750 W with peak power capability up to 3 kW. The testing was performed on the own design magnetron sputtering device with good coolingcapability. Cathode voltage and cathode current were recorded during both ON-Pulse and OFF-Pulse. This monitoring of the target current and voltage shows that transient spikes occur and the waveforms differ from idealized behavior. The voltage spike at t the beginning of the ON-Pulse brings high energy electrons into the magnetron discharge. Because the discharge current is low in the starting part of the ON-Pulse species created in this time are supposed to be more favorable for the generation of radicals than for sputtering. During the Off-Pulse the discharge current first decays rapidly and later more slowly to zero, but it is not falling to zero completely when the Off-Pulse is shorter than 10 μs about. This two-step decay of the magnetron cu An experimental pulse power supply source for magnetron pulse sputtering has been designed and built. The mean power is 750 W with peak power capability up to 3 kW. The testing was performed on the own design magnetron sputtering device with good coolingcapability. Cathode voltage and cathode current were recorded during both ON-Pulse and OFF-Pulse. This monitoring of the target current and voltage shows that transient spikes occur and the waveforms differ from idealized behavior. The voltage spike at t the beginning of the ON-Pulse brings high energy electrons into the magnetron discharge. Because the discharge current is low in the starting part of the ON-Pulse species created in this time are supposed to be more favorable for the generation of radicals than for sputtering. During the Off-Pulse the discharge current first decays rapidly and later more slowly to zero, but it is not falling to zero completely when the Off-Pulse is shorter than 10 μs about. This two-step decay of the magnetron cu (en)
Title	Pulse power supply for magnetron sputtering. Pulse power supply for magnetron sputtering. (en) Pulsní zdroj pro magnetronové naprašování (cs)
skos:prefLabel	Pulse power supply for magnetron sputtering. Pulse power supply for magnetron sputtering. (en) Pulsní zdroj pro magnetronové naprašování (cs)
skos:notation	RIV/00216305:26220/05:PU54614!RIV06-MSM-26220___
http://linked.open.../vavai/riv/strany	163-168
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM0021630503)
http://linked.open...vai/riv/dodaniDat	2006
http://linked.open...aciTvurceVysledku	Boušek, Jaroslav
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta elektrotechniky a komunikačních technologií
http://linked.open...dnocenehoVysledku	539688
http://linked.open...ai/riv/idVysledku	RIV/00216305:26220/05:PU54614
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Pulse power supply; magnetron sputtering; electron energy. (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering Pulse power supply electron energy.
http://linked.open...ontrolniKodProRIV	[86C2A3E7238E]
http://linked.open...v/mistoKonaniAkce	Chania, Crete, Greece
http://linked.open...i/riv/mistoVydani	Brno
http://linked.open...i/riv/nazevZdroje	Socrates Workshop
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	1 (xsd:int)
http://linked.open...UplatneniVysledku	2005
http://linked.open...iv/tvurceVysledku	Boušek, Jaroslav
http://linked.open...vavai/riv/typAkce	CST - Celostátní
http://linked.open.../riv/zahajeniAkce	2005-09-21 (xsd:date)
http://linked.open...n/vavai/riv/zamer	Nové trendy v mikroelektronických systémech a nanotechnologiích (MIKROSYN)
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Ing. Zdeněk Novotný CSc.
https://schema.org/isbn	80-214-3042-7
http://localhost/t...ganizacniJednotka	26220

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