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  • An experimental pulse power supply source for magnetron pulse sputtering has been designed and built. Maximal mean power is 750 W with peak power capability up to 3 kW. The testing was performed on the own design magnetron sputterinng device with good cooling capability. Cathode voltage and cathode current were recorded during the ON-Pulse and during the OFF-Pulse. Operating at low frequency range the magnetron voltage seemed to have square-wave characteristics. Monitoring the target current and voltagee waveforms during pulse operation shows that transient spikes occure and the waveforms differ from this idealized behavior. At the beginning of the ON-Pulse, there is a voltage spike which brings high energy electrons into the magnetron discharge. Because the discharge current is low in the starting part of the ON-Pulse species created in this time are supposed to be more favorable for the generation of radicals than for sputtering. During the Off-Pulse the discharge current first decays rapidly and la
  • An experimental pulse power supply source for magnetron pulse sputtering has been designed and built. Maximal mean power is 750 W with peak power capability up to 3 kW. The testing was performed on the own design magnetron sputterinng device with good cooling capability. Cathode voltage and cathode current were recorded during the ON-Pulse and during the OFF-Pulse. Operating at low frequency range the magnetron voltage seemed to have square-wave characteristics. Monitoring the target current and voltagee waveforms during pulse operation shows that transient spikes occure and the waveforms differ from this idealized behavior. At the beginning of the ON-Pulse, there is a voltage spike which brings high energy electrons into the magnetron discharge. Because the discharge current is low in the starting part of the ON-Pulse species created in this time are supposed to be more favorable for the generation of radicals than for sputtering. During the Off-Pulse the discharge current first decays rapidly and la (en)
  • An experimental pulse power supply source for magnetron pulse sputtering has been designed and built. Maximal mean power is 750 W with peak power capability up to 3 kW. The testing was performed on the own design magnetron sputterinng device with good cooling capability. Cathode voltage and cathode current were recorded during the ON-Pulse and during the OFF-Pulse. Operating at low frequency range the magnetron voltage seemed to have square-wave characteristics. Monitoring the target current and voltagee waveforms during pulse operation shows that transient spikes occure and the waveforms differ from this idealized behavior. At the beginning of the ON-Pulse, there is a voltage spike which brings high energy electrons into the magnetron discharge. Because the discharge current is low in the starting part of the ON-Pulse species created in this time are supposed to be more favorable for the generation of radicals than for sputtering. During the Off-Pulse the discharge current first decays rapidly and la (cs)
Title
  • Zdroj pro Pulsní Magnetronové Naprašování.
  • Pulse Power Source for Magnetron Sputtering (en)
  • Zdroj pro Pulsní Magnetronové Naprašování. (cs)
skos:prefLabel
  • Zdroj pro Pulsní Magnetronové Naprašování.
  • Pulse Power Source for Magnetron Sputtering (en)
  • Zdroj pro Pulsní Magnetronové Naprašování. (cs)
skos:notation
  • RIV/00216305:26220/05:PU54534!RIV06-MSM-26220___
http://linked.open.../vavai/riv/strany
  • 105-110
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM0021630503)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 552010
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26220/05:PU54534
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Magnetron pulse sputtering; target current and voltage waveforms; electron energy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [EB67C0476BBB]
http://linked.open...v/mistoKonaniAkce
  • Brno
http://linked.open...i/riv/mistoVydani
  • Brno
http://linked.open...i/riv/nazevZdroje
  • Mikrosyn. Nové trendy v mikroelektronických systémech a nanotechnologiích. Sborník seminare. Brno 12.12.2005
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Boušek, Jaroslav
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • Ing. Zdeněk Novotný CSc.
https://schema.org/isbn
  • 80-214-3116-4
http://localhost/t...ganizacniJednotka
  • 26220
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