About: Depozice pasivačních vrstev SiNx a SiO2.     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
Description
  • In the semiconductor and photovoltaic application, the surface passivation is a very important process for adjustment of silicon surface properties. It brings reduction of recombination centers that arise from previous technology steps. The surface recombination is decreased and the effective lifetime is increased. For passivation layers deposition more methods are possible. The most important method is PECVD (Plasma-Enhanced Chemical Vapor Deposition) and LPCVD (Low-Pressure Chemical Vapor Deposition).. In this paper, deposition of the passivation layers by means of reactive magnetron sputtering is dealt.
  • In the semiconductor and photovoltaic application, the surface passivation is a very important process for adjustment of silicon surface properties. It brings reduction of recombination centers that arise from previous technology steps. The surface recombination is decreased and the effective lifetime is increased. For passivation layers deposition more methods are possible. The most important method is PECVD (Plasma-Enhanced Chemical Vapor Deposition) and LPCVD (Low-Pressure Chemical Vapor Deposition).. In this paper, deposition of the passivation layers by means of reactive magnetron sputtering is dealt. (en)
  • In the semiconductor and photovoltaic application, the surface passivation is a very important process for adjustment of silicon surface properties. It brings reduction of recombination centers that arise from previous technology steps. The surface recombination is decreased and the effective lifetime is increased. For passivation layers deposition more methods are possible. The most important method is PECVD (Plasma-Enhanced Chemical Vapor Deposition) and LPCVD (Low-Pressure Chemical Vapor Deposition).. In this paper, deposition of the passivation layers by means of reactive magnetron sputtering is dealt. (cs)
Title
  • Depozice pasivačních vrstev SiNx a SiO2.
  • Deposition of SiNx and SiO2 passivation layers. (en)
  • Depozice pasivačních vrstev SiNx a SiO2. (cs)
skos:prefLabel
  • Depozice pasivačních vrstev SiNx a SiO2.
  • Deposition of SiNx and SiO2 passivation layers. (en)
  • Depozice pasivačních vrstev SiNx a SiO2. (cs)
skos:notation
  • RIV/00216305:26220/05:PU54017!RIV06-MSM-26220___
http://linked.open.../vavai/riv/strany
  • 111-116
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM0021630503)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 517281
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26220/05:PU54017
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • surface passivation, deposition (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [AB4E982336D0]
http://linked.open...v/mistoKonaniAkce
  • Brno
http://linked.open...i/riv/mistoVydani
  • Brno
http://linked.open...i/riv/nazevZdroje
  • Mikrosyn. Nové trendy v mikroelektronických systémech a nanotechnologiích
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Boušek, Jaroslav
  • Hégr, Ondřej
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • nakl. Z. Novotný
https://schema.org/isbn
  • 80-214-3116-4
http://localhost/t...ganizacniJednotka
  • 26220
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 91 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software