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| rdf:type
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| Description
| - Experimental investigation on cermet thick film resistors shows, that non-linearity and 1/f noise spectral density is changed after high voltage stressing. Stressing method is based on the short current pulse from capacitor discharge. In the thick film resistor the current is flying through conductive chains composed of conducting grains and filaments separated by thin insulating layer. It is supposed, that multi-spot contact is created between contact and resistive layer. Non-linearity and noise spectrral voltage density were measured before and after high voltage stress. Two mechanisms were observed. (i) Sample resistance, non-linearity and noise decreases after high voltage stressing. We suppose, that the effect of resistance, non-linearity and noise lowering is caused by filaments fritting. During this process thin isolating film between metallic grains is either doped or shorted. (ii) Sample resistance, non-linearity and noise increases after high voltage stressing. We suppose that in this case s
- Experimental investigation on cermet thick film resistors shows, that non-linearity and 1/f noise spectral density is changed after high voltage stressing. Stressing method is based on the short current pulse from capacitor discharge. In the thick film resistor the current is flying through conductive chains composed of conducting grains and filaments separated by thin insulating layer. It is supposed, that multi-spot contact is created between contact and resistive layer. Non-linearity and noise spectrral voltage density were measured before and after high voltage stress. Two mechanisms were observed. (i) Sample resistance, non-linearity and noise decreases after high voltage stressing. We suppose, that the effect of resistance, non-linearity and noise lowering is caused by filaments fritting. During this process thin isolating film between metallic grains is either doped or shorted. (ii) Sample resistance, non-linearity and noise increases after high voltage stressing. We suppose that in this case s (en)
- Experimental investigation on cermet thick film resistors shows, that non-linearity and 1/f noise spectral density is changed after high voltage stressing. Stressing method is based on the short current pulse from capacitor discharge. In the thick film resistor the current is flying through conductive chains composed of conducting grains and filaments separated by thin insulating layer. It is supposed, that multi-spot contact is created between contact and resistive layer. Non-linearity and noise spectrral voltage density were measured before and after high voltage stress. Two mechanisms were observed. (i) Sample resistance, non-linearity and noise decreases after high voltage stressing. We suppose, that the effect of resistance, non-linearity and noise lowering is caused by filaments fritting. During this process thin isolating film between metallic grains is either doped or shorted. (ii) Sample resistance, non-linearity and noise increases after high voltage stressing. We suppose that in this case s (cs)
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| Title
| - Non-linearity and noise characterisation of thick-film resistors after high voltage stress
- Non-linearity and noise characterisation of thick-film resistors after high voltage stress (en)
- Vyhodnocení kvality tlustovrstvových odporů pomocí měření šumu a nelinearity po namáhání vysokonapěťovým pulsem (cs)
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| skos:prefLabel
| - Non-linearity and noise characterisation of thick-film resistors after high voltage stress
- Non-linearity and noise characterisation of thick-film resistors after high voltage stress (en)
- Vyhodnocení kvality tlustovrstvových odporů pomocí měření šumu a nelinearity po namáhání vysokonapěťovým pulsem (cs)
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| skos:notation
| - RIV/00216305:26220/04:PU45391!RIV/2005/MSM/262205/N
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(ME 605), Z(MSM 262200022)
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/00216305:26220/04:PU45391
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - Non-linearity, THI, Noise, High voltage stressing, Thick film resistors (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...v/mistoKonaniAkce
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| http://linked.open...i/riv/mistoVydani
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| http://linked.open...i/riv/nazevZdroje
| - Proceedings of the 3rd European Microelectronics and Packaging Symposium with Table Top Exhibition
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| http://linked.open...in/vavai/riv/obor
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| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
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| http://linked.open...vavai/riv/projekt
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| http://linked.open...UplatneniVysledku
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| http://linked.open...iv/tvurceVysledku
| - Hájek, Karel
- Majzner, Jiří
- Sedláková, Vlasta
- Šikula, Josef
- Hefner, Štěpán
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| http://linked.open...vavai/riv/typAkce
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| http://linked.open.../riv/zahajeniAkce
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| http://linked.open...n/vavai/riv/zamer
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| number of pages
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| http://purl.org/ne...btex#hasPublisher
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| https://schema.org/isbn
| |
| http://localhost/t...ganizacniJednotka
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