About: Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

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About: Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4. A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4. (en)
Title	Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence (en)
skos:prefLabel	Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence (en)
skos:notation	RIV/00216305:26210/09:PU81391!RIV10-MSM-26210___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(OC09013)
http://linked.open...iv/cisloPeriodika	2
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Kaiser, Jozef
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta strojního inženýrství
http://linked.open...dnocenehoVysledku	323207
http://linked.open...ai/riv/idVysledku	RIV/00216305:26210/09:PU81391
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	XUV interference litography, capillary-discharge based table-top source (en)
http://linked.open.../riv/klicoveSlovo	XUV interference litography capillary-discharge based table-top source
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[178FF4958C46]
http://linked.open...i/riv/nazevZdroje	NANOTECHNOLOGY
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...vavai/riv/projekt	Development and application of capillary-discharge based short wavelength radiation sources
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	20
http://linked.open...iv/tvurceVysledku	Kaiser, Jozef
issn	0957-4484
number of pages	4 (xsd:int)
http://localhost/t...ganizacniJednotka	26210

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