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  • New purifn. method was applied to obtain epsilon HNIW which has low impact sensitivity. The method is based on removing the impurities from a soln. of alpha HNIW by a chem. reaction to obtain pure epsilon form. For comparison, selected different published methods for recrystn. of HNIW to obtain the epsilon form were studied. Methods are based on solvent-antisolvent technique. The optimum parameters were applied to enhance the crystal size and shape of epsilon-HNIW The thermal stability of the prepd. samples was studied by using DTA technique (DTA). Qual. anal. of the crystal size and shape was done using scanning electron microscope (SEM) devise. Impact sensitivity was measured by falling hammer test. The impact sensitivity of HNIW decreases by obtaining small particles with regular shape. While the obtained crystals from the new method has regular smooth surface, with small particle size and its impact sensitivity is lower than RDX and HMX.
  • New purifn. method was applied to obtain epsilon HNIW which has low impact sensitivity. The method is based on removing the impurities from a soln. of alpha HNIW by a chem. reaction to obtain pure epsilon form. For comparison, selected different published methods for recrystn. of HNIW to obtain the epsilon form were studied. Methods are based on solvent-antisolvent technique. The optimum parameters were applied to enhance the crystal size and shape of epsilon-HNIW The thermal stability of the prepd. samples was studied by using DTA technique (DTA). Qual. anal. of the crystal size and shape was done using scanning electron microscope (SEM) devise. Impact sensitivity was measured by falling hammer test. The impact sensitivity of HNIW decreases by obtaining small particles with regular shape. While the obtained crystals from the new method has regular smooth surface, with small particle size and its impact sensitivity is lower than RDX and HMX. (en)
Title
  • Path to epsilon - HNIW with Reduced Sensitivity
  • Path to epsilon - HNIW with Reduced Sensitivity (en)
skos:prefLabel
  • Path to epsilon - HNIW with Reduced Sensitivity
  • Path to epsilon - HNIW with Reduced Sensitivity (en)
skos:notation
  • RIV/00216275:25310/11:39892492!RIV12-MSM-25310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • S, Z(MSM0021627501)
http://linked.open...iv/cisloPeriodika
  • 3
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 219702
http://linked.open...ai/riv/idVysledku
  • RIV/00216275:25310/11:39892492
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • SEM; impact sensitivity; thermal stability; crystallization; HNIW (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • PL - Polská republika
http://linked.open...ontrolniKodProRIV
  • [57C2005A1DC1]
http://linked.open...i/riv/nazevZdroje
  • Central European Journal of Energetic Materials
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 8
http://linked.open...iv/tvurceVysledku
  • Elbeih, Ahmed Ikhlas Mohamed
  • Zeman, Svatopluk
  • Husarová, Adéla
http://linked.open...ain/vavai/riv/wos
  • 000299916900003
http://linked.open...n/vavai/riv/zamer
issn
  • 1733-7178
number of pages
http://localhost/t...ganizacniJednotka
  • 25310
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