About: Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6
Description	Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V. Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V. (en)
Title	Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry (en)
skos:prefLabel	Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry (en)
skos:notation	RIV/00216224:14740/14:00073337!RIV15-MSM-14740___
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED1.1.00/02.0068), P(ED2.1.00/03.0086), P(TA02010784)
http://linked.open...iv/cisloPeriodika	november
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Ohlídal, Ivan Zajíčková, Lenka Nečas, David Franta, Daniel Eliáš, Marek Čudek, Vladimír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Středoevropský technologický institut
http://linked.open...dnocenehoVysledku	4284
http://linked.open...ai/riv/idVysledku	RIV/00216224:14740/14:00073337
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Variable-angle spectroscopic ellipsometry; Mapping spectroscopic ellipsometry; Imaging spectroscopic reflectometry; Non-uniform thin films (en)
http://linked.open.../riv/klicoveSlovo	Non-uniform thin films Imaging spectroscopic reflectometry Mapping spectroscopic ellipsometry Variable-angle spectroscopic ellipsometry
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[31F5FE32EBB2]
http://linked.open...i/riv/nazevZdroje	Thin Solid Films
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	10 (xsd:int)
http://linked.open...vavai/riv/projekt	Central european institute of technology Regional R&D center for low-cost plasma and nanotechnology surface modifications Optimization of thin film systems used in the optics industry
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	571
http://linked.open...iv/tvurceVysledku	Eliáš, Marek Franta, Daniel Nečas, David Ohlídal, Ivan Zajíčková, Lenka Ohlídal, Miloslav Čudek, Vladimír Sládková, Lucia Vizďa, František Vodák, Jiří
http://linked.open...ain/vavai/riv/wos	000346055200044
issn	0040-6090
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.tsf.2013.12.036
http://localhost/t...ganizacniJednotka	14740

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