About: Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing. Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing. (en) Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing. (cs)
Title	Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO (en) Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO (cs)
skos:prefLabel	Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO (en) Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO (cs)
skos:notation	RIV/00216224:14330/03:00008608!RIV08-MSM-14330___
http://linked.open.../vavai/riv/strany	58
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/00/P037), Z(MSM 143100003)
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Valtr, Miroslav Zajíčková, Lenka Buršíková, Vilma
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Fakulta informatiky
http://linked.open...dnocenehoVysledku	603088
http://linked.open...ai/riv/idVysledku	RIV/00216224:14330/03:00008608
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	plasma; DLC; films; methane; HMDSO; pecvd; radio frequency; discharge; FTIR; normalized absorbance (en)
http://linked.open.../riv/klicoveSlovo	radio frequency normalized absorbance FTIR discharge films plasma HMDSO methane DLC pecvd
http://linked.open...ontrolniKodProRIV	[3810209915B1]
http://linked.open...v/mistoKonaniAkce	23.-24. 9. 2003, Brno
http://linked.open...i/riv/mistoVydani	Brno
http://linked.open...i/riv/nazevZdroje	JUNIORMAT 03
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...vavai/riv/projekt	Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
http://linked.open...UplatneniVysledku	2003
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Valtr, Miroslav Zajíčková, Lenka
http://linked.open...vavai/riv/typAkce	CST - Celostátní
http://linked.open.../riv/zahajeniAkce	2003-01-01 (xsd:date)
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20143100003
number of pages	2 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Vysoké učení technické v Brně. Fakulta strojního inženýrství. Ústav materiálových věd a inženýrství; Česká společnost pro nové materiály a technologie
https://schema.org/isbn	80-214-2462-1
http://localhost/t...ganizacniJednotka	14330

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