About: THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA     Goto   Sponge   NotDistinct   Permalink

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Description
  • Plasma generated by DCSBD was investigated for cleaning and removing of organic contaminants from semiconductor materials. ITO glass used in photovoltaics and three types of most often used silicon surfaces in semiconductor industry – precleaned silicon, thermally oxidized silicon and H-terminated silicon was studied. The changes in chemical bonds on silicon surfaces were investigated by FTIR. Removing of IPA from silicon substrates was observed by XPS measurements. Effectivity of DCSBD as cleaning agent in comparison with isopropylacohol was investigated on ITO glass samples by XPS measurement.
  • Plasma generated by DCSBD was investigated for cleaning and removing of organic contaminants from semiconductor materials. ITO glass used in photovoltaics and three types of most often used silicon surfaces in semiconductor industry – precleaned silicon, thermally oxidized silicon and H-terminated silicon was studied. The changes in chemical bonds on silicon surfaces were investigated by FTIR. Removing of IPA from silicon substrates was observed by XPS measurements. Effectivity of DCSBD as cleaning agent in comparison with isopropylacohol was investigated on ITO glass samples by XPS measurement. (en)
Title
  • THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA
  • THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA (en)
skos:prefLabel
  • THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA
  • THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA (en)
skos:notation
  • RIV/00216224:14310/12:00064658!RIV13-MSM-14310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ED2.1.00/03.0086)
http://linked.open...iv/cisloPeriodika
  • S
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 133292
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/12:00064658
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • DCSBD; silicon substrates; ITO glass; cleaning; organic contaminants (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [B7A3FCD1CB49]
http://linked.open...i/riv/nazevZdroje
  • CHEMICKÉ LISTY
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 106
http://linked.open...iv/tvurceVysledku
  • Kováčik, Dušan
  • Zahoranová, Anna
  • Greguš, Ján
  • Medvecká, Veronika
issn
  • 0009-2770
number of pages
http://localhost/t...ganizacniJednotka
  • 14310
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