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  • Waveforms of discharges voltage and current and their changes due to changes of plasma parameters were studied recently. Mainly the sensitive reaction of Fourier components of discharge voltage to presence of deposited or etched thin films showed up as an useful diagnostic method of plasma processing.
  • Waveforms of discharges voltage and current and their changes due to changes of plasma parameters were studied recently. Mainly the sensitive reaction of Fourier components of discharge voltage to presence of deposited or etched thin films showed up as an useful diagnostic method of plasma processing. (en)
Title
  • Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing
  • Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing (en)
skos:prefLabel
  • Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing
  • Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing (en)
skos:notation
  • RIV/00216224:14310/12:00061370!RIV13-MSM-14310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ED2.1.00/03.0086)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 138992
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  • RIV/00216224:14310/12:00061370
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  • higher harmonics; RF discharge; plasma processing (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [C16F1FB145FF]
http://linked.open...v/mistoKonaniAkce
  • Brno
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  • Brno
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  • Potential and Application of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstrakts 2012
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  • Buršíková, Vilma
  • Dvořák, Pavel
  • Žemlička, Radek
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http://linked.open.../riv/zahajeniAkce
number of pages
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  • Masaryk University
https://schema.org/isbn
  • 9788021059795
http://localhost/t...ganizacniJednotka
  • 14310
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