About: Monitoring and control of RF driven PVD, PECVD and etching plasmas using Fourier components of discharge voltages

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About: Monitoring and control of RF driven PVD, PECVD and etching plasmas using Fourier components of discharge voltages Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	PVD and PECVD require monitoring and control of the deposition process in order to reproducibly prepare coatings of desired quality. RF driven magnetron sputtering as well as RF driven PECVD processes use capacitively coupled plasma to deposit various types of thin films. Due to the nonlinearity of sheaths, higher harmonics of discharge voltage and current are produced in capacitive discharges. Since the sheaths are in contact with bulk plasma, higher harmonics are strong in particular when their frequencies are close to the series plasma–sheath resonance. Also, the harmonics are strong when they are not damped by collisions between electrons and neutrals. Both conditions are fulfilled at pressures typically below 10 Pa used in majority of PVD and PECVD applications. Fourier components of discharge voltages were measured in two different reactive plasmas and their response to creation or destruction of a thin film was studied. PVD and PECVD require monitoring and control of the deposition process in order to reproducibly prepare coatings of desired quality. RF driven magnetron sputtering as well as RF driven PECVD processes use capacitively coupled plasma to deposit various types of thin films. Due to the nonlinearity of sheaths, higher harmonics of discharge voltage and current are produced in capacitive discharges. Since the sheaths are in contact with bulk plasma, higher harmonics are strong in particular when their frequencies are close to the series plasma–sheath resonance. Also, the harmonics are strong when they are not damped by collisions between electrons and neutrals. Both conditions are fulfilled at pressures typically below 10 Pa used in majority of PVD and PECVD applications. Fourier components of discharge voltages were measured in two different reactive plasmas and their response to creation or destruction of a thin film was studied. (en)
Title	Monitoring and control of RF driven PVD, PECVD and etching plasmas using Fourier components of discharge voltages Monitoring and control of RF driven PVD, PECVD and etching plasmas using Fourier components of discharge voltages (en)
skos:prefLabel	Monitoring and control of RF driven PVD, PECVD and etching plasmas using Fourier components of discharge voltages Monitoring and control of RF driven PVD, PECVD and etching plasmas using Fourier components of discharge voltages (en)
skos:notation	RIV/00216224:14310/12:00057727!RIV13-GA0-14310___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0086), P(GAP205/12/0407), P(GD104/09/H080)
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Žemlička, Radek Vašina, Petr Dvořák, Pavel Klein, Peter
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	151602
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/12:00057727
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	reactive magnetron sputtering; PECVD; process monitoring and control; higher harmonics (en)
http://linked.open.../riv/klicoveSlovo	higher harmonics PECVD reactive magnetron sputtering process monitoring and control
http://linked.open...ontrolniKodProRIV	[A5E8B90DBD1B]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Plasmachemical processes and their technological applications Regional R&D center for low-cost plasma and nanotechnology surface modifications Understanding of Hybrid PVD-PECVD Process with Aim to Control Grow of Nanostructured Composite Coatings
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Dvořák, Pavel Vašina, Petr Žemlička, Radek Klein, Peter
http://localhost/t...ganizacniJednotka	14310

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