About: Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage

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About: Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Fourier components of discharge voltages were measured in two different reactive plasmas and their response to the creation or destruction of a thin film was studied. In reactive magnetron sputtering the effect of transition from the metallic to the compound mode accompanied by creation of a compound film on the sputtered target was observed. Further, deposition and etching of a DLC film and their effects on amplitudes of Fourier components of the discharge voltage were studied. It was shown that the Fourier components, including higher harmonic frequencies, sensitively react to the presence of a film. Therefore, they can be used as a powerful tool for the monitoring of deposition and etching processes. It was demonstrated that the behaviour of the Fourier components was caused in both experiments by the presence of the film. The behaviour of the Fourier components can be explained by the difference between coefficients of secondary electron emission of the film and its underlying material. Fourier components of discharge voltages were measured in two different reactive plasmas and their response to the creation or destruction of a thin film was studied. In reactive magnetron sputtering the effect of transition from the metallic to the compound mode accompanied by creation of a compound film on the sputtered target was observed. Further, deposition and etching of a DLC film and their effects on amplitudes of Fourier components of the discharge voltage were studied. It was shown that the Fourier components, including higher harmonic frequencies, sensitively react to the presence of a film. Therefore, they can be used as a powerful tool for the monitoring of deposition and etching processes. It was demonstrated that the behaviour of the Fourier components was caused in both experiments by the presence of the film. The behaviour of the Fourier components can be explained by the difference between coefficients of secondary electron emission of the film and its underlying material. (en)
Title	Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage (en)
skos:prefLabel	Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage (en)
skos:notation	RIV/00216224:14310/10:00046208!RIV11-GA0-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/07/1669), P(GP202/08/P038), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	12
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Žemlička, Radek Vašina, Petr Buršíková, Vilma Dvořák, Pavel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	272489
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/10:00046208
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	plasma; higher harmonic frequencies; capacitively coupled discharge; reactive magnetron sputtering; DLC (en)
http://linked.open.../riv/klicoveSlovo	higher harmonic frequencies plasma reactive magnetron sputtering DLC capacitively coupled discharge
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[C6ACBD7FC578]
http://linked.open...i/riv/nazevZdroje	Plasma Physics and Controlled Fusion
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges Study of hybrid deposition process and its application for thin film deposition
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	52
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Dvořák, Pavel Vašina, Petr Žemlička, Radek
http://linked.open...ain/vavai/riv/wos	000284406600013
http://linked.open...n/vavai/riv/zamer	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0741-3335
number of pages	12 (xsd:int)
http://localhost/t...ganizacniJednotka	14310

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