Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection.
Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection. (en)