About: Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Reactive sputtering controlled by flow of the reactive gas suffers from problems in processing stability caused by an abrupt transition between the metallic and the compound mode. During this transition many important parameters including target composition and gas composition change dramatically. A sensitive monitoring method is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages. Voltage waveforms recorded from the cathode and from an uncompensated probe were analyzed. Uncompensated probe exhibited higher sensitivity significantly better than sensitivity of any other known electrical method used for the control of magnetron sputtering process. Moreover, some particular experiments show that the changes in amplitudes of the harmonics by the transition are due to the changes of the target composition rather than due the change of the gas composition. Reactive sputtering controlled by flow of the reactive gas suffers from problems in processing stability caused by an abrupt transition between the metallic and the compound mode. During this transition many important parameters including target composition and gas composition change dramatically. A sensitive monitoring method is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages. Voltage waveforms recorded from the cathode and from an uncompensated probe were analyzed. Uncompensated probe exhibited higher sensitivity significantly better than sensitivity of any other known electrical method used for the control of magnetron sputtering process. Moreover, some particular experiments show that the changes in amplitudes of the harmonics by the transition are due to the changes of the target composition rather than due the change of the gas composition. (en)
Title	Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? (en)
skos:prefLabel	Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? (en)
skos:notation	RIV/00216224:14310/09:00029369!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GP202/08/P038), Z(MSM0021622411)
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Vašina, Petr Dvořák, Pavel
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	320448
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/09:00029369
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	higher harmonics; plasma; discharge; reactive sputtering; magnetron (en)
http://linked.open.../riv/klicoveSlovo	higher harmonics reactive sputtering discharge plasma magnetron
http://linked.open...ontrolniKodProRIV	[2CCF78FB3DCE]
http://linked.open...v/mistoKonaniAkce	Blansko
http://linked.open...i/riv/mistoVydani	Brno
http://linked.open...i/riv/nazevZdroje	Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...vavai/riv/projekt	Study of hybrid deposition process and its application for thin film deposition
http://linked.open...UplatneniVysledku	2009
http://linked.open...iv/tvurceVysledku	Dvořák, Pavel Vašina, Petr
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2009-01-01 (xsd:date)
http://linked.open...n/vavai/riv/zamer	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
number of pages	1 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Vysoké učení technické v Brně
https://schema.org/isbn	978-80-214-3875-0
http://localhost/t...ganizacniJednotka	14310

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software