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  • Ultraviolet-assisted curing (UV curing) has been recently applied to enhance the mechanical properties of low-k films. Knowledge about which ultraviolet energies are most effective is still limited and the consequences of applying the UV-curing process to integrated stacks in on-chip interconnects unknown. To clarify these open questions we investigated the optical properties of a SiCOH low-k layer by purged ultraviolet spectroscopic ellipsometry in the energy region 2-9 eV. The complex refractive index of the low-k film shows an absorption edge with a superimposed absorption band at 6.4 eV that vanishes upon ultraviolet-assisted curing. Comparison with Fourier transform infrared transmission demonstrates that the absorption at 6.4 eV must be attributed to the organic porogens, which have also influences on the absorption edge.
  • Ultraviolet-assisted curing (UV curing) has been recently applied to enhance the mechanical properties of low-k films. Knowledge about which ultraviolet energies are most effective is still limited and the consequences of applying the UV-curing process to integrated stacks in on-chip interconnects unknown. To clarify these open questions we investigated the optical properties of a SiCOH low-k layer by purged ultraviolet spectroscopic ellipsometry in the energy region 2-9 eV. The complex refractive index of the low-k film shows an absorption edge with a superimposed absorption band at 6.4 eV that vanishes upon ultraviolet-assisted curing. Comparison with Fourier transform infrared transmission demonstrates that the absorption at 6.4 eV must be attributed to the organic porogens, which have also influences on the absorption edge. (en)
Title
  • Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing
  • Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing (en)
skos:prefLabel
  • Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing
  • Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing (en)
skos:notation
  • RIV/00216224:14310/08:00026015!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM0021622410)
http://linked.open...iv/cisloPeriodika
  • 5
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 385018
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/08:00026015
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • low-k; ellipsometry; UV-cure (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • BE - Belgické království
http://linked.open...ontrolniKodProRIV
  • [98A3F7AEA5E8]
http://linked.open...i/riv/nazevZdroje
  • Journal of the electrochemical society
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 155
http://linked.open...iv/tvurceVysledku
  • Maršík, Přemysl
  • Baklanov, Mikhail
  • Eslava, Salvador
  • Eymery, Guillaume
  • Iacopi, Francesca
  • Kirschhock, Christine
  • Maex, Karen
  • Martens, Johan
http://linked.open...ain/vavai/riv/wos
  • 000254779700057
http://linked.open...n/vavai/riv/zamer
issn
  • 0013-4651
number of pages
http://localhost/t...ganizacniJednotka
  • 14310
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