About: Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation

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About: Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The aim of the present work was to investigate the influence of the substrate material on the plasma enhanced chemical vapor deposition and the plasma sputtering of thin films in low pressure parallel-plate r.f. discharges. It was observed that the deposition or sputtering rates differed above different materials, e.g., above a substrate and substrate electrode. Moreover, the substrates placed on the bottom r.f. electrode seemed to be mirrored in the thickness of a thin film deposited or sputtered on the upper grounded electrode. The influence of the substrate material on the plasma parameters was studied via Particle In Cell/Monte Carlo computer simulation. According to our finding the mirroring of the substrate was caused by different secondary electron emission yields of the substrate material and material of the substrate electrode. The aim of the present work was to investigate the influence of the substrate material on the plasma enhanced chemical vapor deposition and the plasma sputtering of thin films in low pressure parallel-plate r.f. discharges. It was observed that the deposition or sputtering rates differed above different materials, e.g., above a substrate and substrate electrode. Moreover, the substrates placed on the bottom r.f. electrode seemed to be mirrored in the thickness of a thin film deposited or sputtered on the upper grounded electrode. The influence of the substrate material on the plasma parameters was studied via Particle In Cell/Monte Carlo computer simulation. According to our finding the mirroring of the substrate was caused by different secondary electron emission yields of the substrate material and material of the substrate electrode. (en)
Title	Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation (en)
skos:prefLabel	Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation (en)
skos:notation	RIV/00216224:14310/08:00024731!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/06/0776), P(GA202/07/1669), Z(AV0Z20650511), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	035213
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Valtr, Miroslav Brzobohatý, Oto Buršíková, Vilma Nečas, David Trunec, David
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	372271
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/08:00024731
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	r.f. plasma; computer simulation; secondary electron emision; plasma deposition; plasma sputtering (en)
http://linked.open.../riv/klicoveSlovo	computer simulation plasma deposition plasma sputtering r.f. plasma secondary electron emision
http://linked.open...odStatuVydavatele	CZ - Česká republika
http://linked.open...ontrolniKodProRIV	[3D4CD74724FD]
http://linked.open...i/riv/nazevZdroje	Journal of Physics D: Applied Physics
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges Advanced research and development of low-temperature plasma sources
http://linked.open...UplatneniVysledku	2008
http://linked.open...v/svazekPeriodika	41
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Brzobohatý, Oto Nečas, David Valtr, Miroslav Trunec, David
http://linked.open...ain/vavai/riv/wos	000253177300023
http://linked.open...n/vavai/riv/zamer	Research into experimental methods for examination of the physical properties of matter and their application in advanced technologies Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0022-3727
number of pages	8 (xsd:int)
http://localhost/t...ganizacniJednotka	14310

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