About: Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties

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About: Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Thin organosilicon and silicon oxide films were deposited in r.f. capacitively coupled discharges from a mixture of hexamethyldisiloxane (HMDSO) and oxygen. The concentration of HMDSO was in the range 5-17%. Even for such relatively high dilution of HMDSO the organic-inorganic crossover of the film character was observed due to changes of the HMDSO concentration, but other factors, such as pressure and d.c. self-bias should also be taken into account. When annealed the films changed their composition, chemical structure and mechanical properties. We observed desorption of water, methane and CO or CO2 from the SiO2-like films. The hardness of the SiO2-like film, containing 5% carbon and 25% hydrogen, increased with the increase of annealing temperature from 5.9 (as deposited) to 11.3 GPa (500 oC). Simultaneously, its fracture toughness was significantly improved. These effects were explained by dehydration and cross-linking of the film. Thin organosilicon and silicon oxide films were deposited in r.f. capacitively coupled discharges from a mixture of hexamethyldisiloxane (HMDSO) and oxygen. The concentration of HMDSO was in the range 5-17%. Even for such relatively high dilution of HMDSO the organic-inorganic crossover of the film character was observed due to changes of the HMDSO concentration, but other factors, such as pressure and d.c. self-bias should also be taken into account. When annealed the films changed their composition, chemical structure and mechanical properties. We observed desorption of water, methane and CO or CO2 from the SiO2-like films. The hardness of the SiO2-like film, containing 5% carbon and 25% hydrogen, increased with the increase of annealing temperature from 5.9 (as deposited) to 11.3 GPa (500 oC). Simultaneously, its fracture toughness was significantly improved. These effects were explained by dehydration and cross-linking of the film. (en)
Title	Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties (en)
skos:prefLabel	Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties (en)
skos:notation	RIV/00216224:14310/07:00022272!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(1K05025), P(GA202/07/1669), Z(AV0Z10480505), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Peřina, Vratislav Franclová, Jana Sťahel, Pavel Zajíčková, Lenka Buršíková, Vilma Kučerová, Zuzana
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	440026
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/07:00022272
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Thin films; Organometallic compounds; Plasma deposition; Infrared spectroscopy; Mechanical properties (en)
http://linked.open.../riv/klicoveSlovo	Plasma deposition Thin films Infrared spectroscopy Mechanical properties Organometallic compounds
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[6B60752CD149]
http://linked.open...i/riv/nazevZdroje	Journal of Physics and Chemistry of Solids
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Synthesis of new Si-O(N)-C materials by plasma enhanced CVD Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
http://linked.open...UplatneniVysledku	2007
http://linked.open...v/svazekPeriodika	68
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Macková, Anna Zajíčková, Lenka Peřina, Vratislav Sťahel, Pavel Studýnková, Zuzana Franclová, Jana
http://linked.open...n/vavai/riv/zamer	Jaderná fyzika a příbuzné obory v základním, aplikovaném a interdisciplinárním výzkumu Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0022-3697
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	14310

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