About: Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The electron density, ion flux and argon emission lines were measured in a radio frequency helicon reactor for different static magnetic field amplitude and low rf powers using cylindrical Langmuir probe, planar probe and optical emission spectroscopy (OES). The static magnetic field amplitude created around the plasma source varied from 0 to 10 mT in the helicon source and from 0 to 1.4 mT in the diffusion chamber. The discharge was created in argon and oxygen at 0.7 Pa with rf powers, between 50 and 600 W, applied to the helicon antenna. The variations of the electron density, ion flux taken from Langmuir probe measurement and from planar probe measurement and Ar 750 nm line intensity with the rf power were in good agreement. Hence, it is concluded that the maximum of electron density observed in the diffusion chamber for the highest values of magnetic field is likely to be due to some confinement of the plasma in the source. Measurements in oxygen discharge showed slightly different results. The electron density, ion flux and argon emission lines were measured in a radio frequency helicon reactor for different static magnetic field amplitude and low rf powers using cylindrical Langmuir probe, planar probe and optical emission spectroscopy (OES). The static magnetic field amplitude created around the plasma source varied from 0 to 10 mT in the helicon source and from 0 to 1.4 mT in the diffusion chamber. The discharge was created in argon and oxygen at 0.7 Pa with rf powers, between 50 and 600 W, applied to the helicon antenna. The variations of the electron density, ion flux taken from Langmuir probe measurement and from planar probe measurement and Ar 750 nm line intensity with the rf power were in good agreement. Hence, it is concluded that the maximum of electron density observed in the diffusion chamber for the highest values of magnetic field is likely to be due to some confinement of the plasma in the source. Measurements in oxygen discharge showed slightly different results. (en)
Title	Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor (en)
skos:prefLabel	Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor (en)
skos:notation	RIV/00216224:14310/06:00016195!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GD202/03/H162), Z(MSM0021622411)
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Zajíčková, Lenka Šmíd, Radek
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	473799
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/06:00016195
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Langmuir probe; planar probe; ion flux; electron density (en)
http://linked.open.../riv/klicoveSlovo	Langmuir probe electron density ion flux planar probe
http://linked.open...ontrolniKodProRIV	[319F8E3CC18D]
http://linked.open...v/mistoKonaniAkce	Praha
http://linked.open...i/riv/mistoVydani	Praha
http://linked.open...i/riv/nazevZdroje	WDS'06 Proceedings of Contributed Papers, Part II
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced topics in physics and chemistry of plasmas
http://linked.open...UplatneniVysledku	2006
http://linked.open...iv/tvurceVysledku	Zajíčková, Lenka Šmíd, Radek Bousquet, Angelique Cartry, Gilles Granier, Agnès
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2006-01-01 (xsd:date)
http://linked.open...n/vavai/riv/zamer	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	MATFYZPRESS
https://schema.org/isbn	80-86732-85-1
http://localhost/t...ganizacniJednotka	14310

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software