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  • In this contribution we present a study of the role of secondary electrons in low pressure RF discharge via computer simulation. We have used particle simulation Particle In Cell Monte Carlo (PIC-MC) method. We have shown that the secondary electron emission coefficient (SEC) of electrodes affects plasma density. The change of the SEC from 0.1 to 0.2 induces an increase of plasma density up to 30%. We determined that about 30 % of all electrons in plasma are secondary electrons and electrons created in ionization collisions of secondary electrons. More than half of all ions in plasma are ions, created in ionization collisions of secondary electrons. We have calculated many further characteristics of secondary particles.
  • In this contribution we present a study of the role of secondary electrons in low pressure RF discharge via computer simulation. We have used particle simulation Particle In Cell Monte Carlo (PIC-MC) method. We have shown that the secondary electron emission coefficient (SEC) of electrodes affects plasma density. The change of the SEC from 0.1 to 0.2 induces an increase of plasma density up to 30%. We determined that about 30 % of all electrons in plasma are secondary electrons and electrons created in ionization collisions of secondary electrons. More than half of all ions in plasma are ions, created in ionization collisions of secondary electrons. We have calculated many further characteristics of secondary particles. (en)
Title
  • The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation
  • The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation (en)
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  • The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation
  • The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation (en)
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  • RIV/00216224:14310/05:00025502!RIV10-MSM-14310___
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  • RIV/00216224:14310/05:00025502
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  • secondary electrons; computer simulation (en)
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  • [05B22212D1EC]
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  • Podbanske
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  • Podbanske, Slovakia
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  • Brzobohatý, Oto
  • Trunec, David
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  • Karol Hensel
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  • 80-223-2018-8
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  • 14310
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