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Description
  • Při studiu depozice tenkých vrstev pomocí metody PECVD byl pozorován tzv. zrcadlový jev. Zrcadlovým jevem myslíme to, že deponovaná vrstva na vrchní elektrodě odráží substrat na spodní elektrodě. Hrany obrazu nejsou zcela ostré. Tento jev jsem se snažili vzsvětli pomocí počitačových simulací, kde jako hlavní příčinu označujeme rozdílnost sekundární emise substrátů a dolní elektrody. Jako hlavní výsledek naších simulací uvádíme prostorové rozděleni sekundárních elektronů a iontů dopadajících na protější elektrodu. (cs)
  • We have studied thin film deposition from methane and thin film sputtering in argon in low pressure rf discharge. We have observed that thickness of a thin film deposited on the upper (grounded) electrode has mirrored substrates placed on the bottom rf powered electrode. The mirror effect has been studied via Monte Carlo - Particle In Cell (MC-PIC) computer simulation. In our explanation the mirror effect is caused by the difference between secondary electron emission coefficient of substrate material and material of the powered electrode. This difference in the secondary electron emission coefficient affects plasma density upon the substrates and this leads to higher or lower deposition rate on the upper electrode. In our simulation we have calculated distribution of impact position for electrons on grounded electrode that have flew from the powered electrode. We have calculated this distribution for ions created in ionization collisions (of secondary electrons with neutrals) too. We have carried out
  • We have studied thin film deposition from methane and thin film sputtering in argon in low pressure rf discharge. We have observed that thickness of a thin film deposited on the upper (grounded) electrode has mirrored substrates placed on the bottom rf powered electrode. The mirror effect has been studied via Monte Carlo - Particle In Cell (MC-PIC) computer simulation. In our explanation the mirror effect is caused by the difference between secondary electron emission coefficient of substrate material and material of the powered electrode. This difference in the secondary electron emission coefficient affects plasma density upon the substrates and this leads to higher or lower deposition rate on the upper electrode. In our simulation we have calculated distribution of impact position for electrons on grounded electrode that have flew from the powered electrode. We have calculated this distribution for ions created in ionization collisions (of secondary electrons with neutrals) too. We have carried out (en)
Title
  • Mirror effect in PECVD reactor and its explanation via MC-PIC computer simulation
  • Mirror effect in PECVD reactor and its explanation via MC-PIC computer simulation (en)
  • Zrcadlový jev v PECVD reaktoru a jeho vysvětlení pomocí MC-PIC počitačové simulace (cs)
skos:prefLabel
  • Mirror effect in PECVD reactor and its explanation via MC-PIC computer simulation
  • Mirror effect in PECVD reactor and its explanation via MC-PIC computer simulation (en)
  • Zrcadlový jev v PECVD reaktoru a jeho vysvětlení pomocí MC-PIC počitačové simulace (cs)
skos:notation
  • RIV/00216224:14310/04:00011467!RIV08-GA0-14310___
http://linked.open.../vavai/riv/strany
  • C527-C532
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA202/03/0827)
http://linked.open...iv/cisloPeriodika
  • 54
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 573750
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/04:00011467
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • plasma-material interactions; Monte Carlo/Particle in Cell; plasma simulation; PECVD (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [E43AF645DBFE]
http://linked.open...i/riv/nazevZdroje
  • Czechoslovak Journal of Physics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 2004
http://linked.open...iv/tvurceVysledku
  • Buršíková, Vilma
  • Brzobohatý, Oto
  • Trunec, David
issn
  • 0011-4626
number of pages
http://localhost/t...ganizacniJednotka
  • 14310
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