About: Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods

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About: Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index. In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index. (en) In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index. (cs)
Title	Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods (en) Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods (cs)
skos:prefLabel	Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods (en) Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods (cs)
skos:notation	RIV/00216224:14310/02:00007050!RIV08-GA0-14310___
http://linked.open.../vavai/riv/strany	759-762
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA101/01/1104)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Ohlídal, Ivan Klapetek, Petr Franta, Daniel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	640653
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/02:00007050
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	TiO2 thin films; optical characterization; AFM; boundary roughness (en)
http://linked.open.../riv/klicoveSlovo	optical characterization TiO2 thin films AFM boundary roughness
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[5965552FE04E]
http://linked.open...i/riv/nazevZdroje	Surface and Interface Analysis
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry
http://linked.open...UplatneniVysledku	2002
http://linked.open...v/svazekPeriodika	34
http://linked.open...iv/tvurceVysledku	Franta, Daniel Klapetek, Petr Ohlídal, Ivan Pokorný, Pavel
issn	0142-2421
number of pages	4 (xsd:int)
http://localhost/t...ganizacniJednotka	14310

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