About: Plasmachemical Deposition of Thin Films

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	PECVD deposition of thin films in RF and MW plasma. Hard diamond-like carbon thin films. Transparent SiOx thin films. Polycrystalline diamond. PECVD deposition of thin films in RF and MW plasma. Hard diamond-like carbon thin films. Transparent SiOx thin films. Polycrystalline diamond. (en) PECVD deposition of thin films in RF and MW plasma. Hard diamond-like carbon thin films. Transparent SiOx thin films. Polycrystalline diamond. (cs)
Title	Plasmachemical Deposition of Thin Films Plasmachemical Deposition of Thin Films (en) Plasmachemical Deposition of Thin Films (cs)
skos:prefLabel	Plasmachemical Deposition of Thin Films Plasmachemical Deposition of Thin Films (en) Plasmachemical Deposition of Thin Films (cs)
skos:notation	RIV/00216224:14310/00:00002470!RIV08-MSM-14310___
http://linked.open.../vavai/riv/strany	86
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GV106/96/K245), P(ME 301), P(ME 367), P(OC 527.20), P(VS96084), Z(MSM 143100003)
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Janča, Jan Zajíčková, Lenka
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	721688
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/00:00002470
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	plasma chemical deposition; Thin Films. hard films; plasma polymers; diamond-like (en)
http://linked.open.../riv/klicoveSlovo	plasma polymers Thin Films. hard films diamond-like plasma chemical deposition
http://linked.open...ontrolniKodProRIV	[07634DD01860]
http://linked.open...v/mistoKonaniAkce	October 23-27,2000, Brno
http://linked.open...i/riv/mistoVydani	Brno
http://linked.open...i/riv/nazevZdroje	4th Czech-Russian Seminar on Electrophysical and Thermophysical Processes in Low-Temperature Plasma
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20367 http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20301 Hard and superhard coatings prepared by unconventional plasma processes Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20527.20
http://linked.open...UplatneniVysledku	2000
http://linked.open...iv/tvurceVysledku	Janča, Jan Zajíčková, Lenka
http://linked.open...vavai/riv/typAkce	CST - Celostátní
http://linked.open.../riv/zahajeniAkce	2000-01-01 (xsd:date)
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20143100003
number of pages	10 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Vysoké učení technické v Brně
https://schema.org/isbn	80-214-1600-9
http://localhost/t...ganizacniJednotka	14310

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